{
  "abstract": "Transparent conducting oxides (TCOs) are essential for the optoelectronics industry, but there is a critical gap in cost-effective methods to rapidly deposit low sheet resistance, high transmittance films without damaging delicate materials, including emerging soft semiconductors like metal-halide perovskites. In this work, atmospheric pressure chemical vapor deposition (AP-CVD) is used to synthesise H:In2O3 films with 7.20+/-0.01 Ohm/sq sheet resistance (0.50+/-0.06 mOhm.cm resistivity) and transmittance up to 89% in the near-infrared (NIR), surpassing commercial sputter-deposited indium tin oxide. The growth rate is 40x higher than atomic layer deposition (ALD), and the AP-CVD films are fully processed under atmospheric conditions at only 140 C. Comparison of secondary ion mass spectrometry and time-of-flight elastic recoil detection analysis with changes in carrier concentration indicate that H dopants are introduced from the water oxidant. There is an increase in mobility form 40+/-10 cm2/Vs to 160+/-30 cm2/Vs when changing from O2 to H2O as the oxidant, which is attributed to H dopants passivating oxygen vacancies that act as carrier scattering centers. This work establishes AP-CVD as a promising method for manufacturing high figure-of-merit TCOs in a rapid, scalable and cost-effective manner, using mild growth conditions compatible with thermally-sensitive materials.",
  "abstract_shown": true,
  "affiliations": [],
  "article_type": null,
  "arxiv": "2605.16166",
  "author_total": 17,
  "authors": [
    {
      "name": "Xiaoyu Guo"
    },
    {
      "name": "Hae-Jun Seok"
    },
    {
      "name": "Eilidh L. Quinn"
    },
    {
      "name": "Matthew K Sharpe"
    },
    {
      "name": "Callum. D. McAleese"
    },
    {
      "name": "Yi-Teng Huang"
    },
    {
      "name": "Xinjuan Li"
    },
    {
      "name": "Kexue Li"
    },
    {
      "name": "Chia-Yu Chang"
    },
    {
      "name": "Yongjie Wang"
    },
    {
      "name": "John O'Sullivan"
    },
    {
      "name": "Katie L. Moore"
    },
    {
      "name": "Caterina Ducati"
    },
    {
      "name": "Ruy Sebastian Bonilla"
    },
    {
      "name": "Han-Ki Kim"
    },
    {
      "name": "Abderrahime Sekkat"
    },
    {
      "name": "Robert L. Z. Hoye"
    }
  ],
  "bibtex": "https://research.draconitic.com/paper/1vtypvs6jgv0p.bib",
  "cited_by": 0,
  "doi": "10.48550/arxiv.2605.16166",
  "fulltext_url": null,
  "id": "1vtypvs6jgv0p",
  "issns": [],
  "landing_url": "https://arxiv.org/abs/2605.16166",
  "language": null,
  "licence": "CC-BY-4.0",
  "licence_label": "CC BY 4.0",
  "licence_source": "article",
  "licence_url": "http://creativecommons.org/licenses/by/4.0/",
  "metadata_licence": "CC0-1.0",
  "native_subjects": [
    [
      "arxiv",
      "cond-mat.mtrl-sci"
    ]
  ],
  "openalex": null,
  "pdf_url": "https://arxiv.org/pdf/2605.16166",
  "pmcid": null,
  "pmid": null,
  "published": "2026-05-15",
  "publisher": null,
  "ris": "https://research.draconitic.com/paper/1vtypvs6jgv0p.ris",
  "sources": [
    {
      "first_seen": "2026-10-30T12:27:01Z",
      "native_id": "2605.16166",
      "source": "arxiv",
      "url": "https://arxiv.org/abs/2605.16166"
    }
  ],
  "subjects": [
    {
      "field": "physics",
      "origin": "arxiv:cond-mat.mtrl-sci",
      "subfield": "condensed-matter"
    }
  ],
  "title": "Rapid Atmospheric Vapor Deposition of H:In2O3 Transparent Conducting Oxide Thin Films",
  "title_text": "Rapid Atmospheric Vapor Deposition of H:In2O3 Transparent Conducting Oxide Thin Films",
  "type": "preprint",
  "updated_at": "2026-10-30T12:27:01Z",
  "url": "https://research.draconitic.com/paper/1vtypvs6jgv0p",
  "venue": "arXiv",
  "versions": [
    {
      "doi": "10.1002/sstr.70625",
      "pid": null,
      "relation": "published-as",
      "title": null,
      "venue": null
    }
  ]
}