{
  "abstract": "Si NMR) confirm controlled copolymerization and a limited degree of condensation, preserving Si-OH groups that enhance adhesion to glass substrates. Photolithographic tests demonstrate good uniformity and pattern resolution, despite a narrow process window caused by the competition between deprotection and condensation catalyzed by photoacids. These findings provide promising perspectives for applications in microfluidics and optoelectronics, with future work focusing on broadening process latitude and integrating advanced functionalities.",
  "abstract_shown": true,
  "affiliations": [],
  "article_type": null,
  "arxiv": null,
  "author_total": 3,
  "authors": [
    {
      "name": "Nour Nasrallah"
    },
    {
      "name": "Sylvie Calas"
    },
    {
      "name": "Pascal Etienne"
    }
  ],
  "bibtex": "https://research.draconitic.com/paper/9qtttyfaprnff.bib",
  "cited_by": 0,
  "doi": "10.1039/d6ra01627h",
  "fulltext_url": null,
  "id": "9qtttyfaprnff",
  "issns": [
    "2046-2069"
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  "landing_url": "https://hal.science/hal-05778740v1",
  "language": "en",
  "licence": "CC-BY-NC",
  "licence_label": "CC BY-NC",
  "licence_source": "journal",
  "licence_url": "https://creativecommons.org/licenses/by-nc/4.0/",
  "metadata_licence": null,
  "native_subjects": [
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      "hal",
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    [
      "openalex",
      "2208|Advancements in Photolithography Techniques"
    ]
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  "openalex": "W7171418552",
  "pdf_url": null,
  "pmcid": null,
  "pmid": null,
  "published": "2026-10-05",
  "publisher": "Royal Society of Chemistry",
  "ris": "https://research.draconitic.com/paper/9qtttyfaprnff.ris",
  "sources": [
    {
      "first_seen": "2026-10-30T12:17:47Z",
      "native_id": "hal-05778740",
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      "url": "https://hal.science/hal-05778740v1"
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  "subjects": [
    {
      "field": "physics",
      "origin": "hal:1.phys.cond",
      "subfield": "condensed-matter"
    }
  ],
  "title": "Development and characterization of a chemically amplified positive-tone hybrid resist for thick-film microfabrication",
  "title_text": "Development and characterization of a chemically amplified positive-tone hybrid resist for thick-film microfabrication",
  "type": "peer-reviewed",
  "updated_at": "2026-10-30T12:17:47Z",
  "url": "https://research.draconitic.com/paper/9qtttyfaprnff",
  "venue": "RSC Advances",
  "versions": []
}