{
  "abstract": "Characteristic X ray generation is essential for producing X ray sources and for investigating light matter interactions. Here, we demonstrate that characteristic X ray generation can also be employed to determine the thickness of van der Waals thin films in a non destructive manner. Specifically, we establish a sixth order polynomial model that relates film thickness to the characteristic X ray yield. The model can both predict the X ray yield of graphite films at arbitrary thicknesses and infer the film thickness from a corresponding characteristic X ray yield. We validate the model by comparing its predicted X ray yields for graphite films with those obtained from Monte Carlo simulations. Additionally, we experimentally validated the reliability and feasibility of the proposed method for extracting graphite film thickness via X ray photon yield characterization. Our results provide a non destructive approach for determining the thickness of van der Waals thin films.",
  "abstract_shown": true,
  "affiliations": [],
  "article_type": null,
  "arxiv": "2610.01309",
  "author_total": 10,
  "authors": [
    {
      "name": "Guoshun Luo"
    },
    {
      "name": "Shichao Zhao"
    },
    {
      "name": "Xinyu Liu"
    },
    {
      "name": "Suguo Chen"
    },
    {
      "name": "Yue Wang"
    },
    {
      "name": "Ping Zhang"
    },
    {
      "name": "Zhigang Lu"
    },
    {
      "name": "Shaomeng Wang"
    },
    {
      "name": "Sunchao Huang"
    },
    {
      "name": "Yubin Gong"
    }
  ],
  "bibtex": "https://research.draconitic.com/paper/dqfh3x9ap6mqe.bib",
  "cited_by": 0,
  "doi": "10.48550/arxiv.2610.01309",
  "fulltext_url": null,
  "id": "dqfh3x9ap6mqe",
  "issns": [],
  "landing_url": "https://arxiv.org/abs/2610.01309",
  "language": null,
  "licence": "CC-BY-SA-4.0",
  "licence_label": "CC BY-SA 4.0",
  "licence_source": "article",
  "licence_url": "http://creativecommons.org/licenses/by-sa/4.0/",
  "metadata_licence": "CC0-1.0",
  "native_subjects": [
    [
      "arxiv",
      "physics.app-ph"
    ],
    [
      "arxiv",
      "physics.optics"
    ]
  ],
  "openalex": null,
  "pdf_url": "https://arxiv.org/pdf/2610.01309",
  "pmcid": null,
  "pmid": null,
  "published": "2026-10-01",
  "publisher": null,
  "ris": "https://research.draconitic.com/paper/dqfh3x9ap6mqe.ris",
  "sources": [
    {
      "first_seen": "2026-10-30T12:26:03Z",
      "native_id": "2610.01309",
      "source": "arxiv",
      "url": "https://arxiv.org/abs/2610.01309"
    }
  ],
  "subjects": [
    {
      "field": "physics",
      "origin": "arxiv:physics.app-ph",
      "subfield": "applied-instrumentation"
    },
    {
      "field": "physics",
      "origin": "arxiv:physics.optics",
      "subfield": "optics-photonics"
    }
  ],
  "title": "Determination of van der Waals thin film thickness via characteristic X-ray photon yield",
  "title_text": "Determination of van der Waals thin film thickness via characteristic X-ray photon yield",
  "type": "preprint",
  "updated_at": "2026-10-30T12:26:03Z",
  "url": "https://research.draconitic.com/paper/dqfh3x9ap6mqe",
  "venue": "arXiv",
  "versions": []
}