{
  "abstract": "Titanium nitride (TiN) is a promising superconducting material for scalable quantum technologies owing to its tunable kinetic inductance and compatibility with CMOS thin-film processing. However, the superconducting performance of atomic-layer-deposited TiN can be degraded by oxygen incorporation, off-stoichiometry, and crystallographic disorder. In this work, we investigate rapid thermal annealing (RTA) in high-purity nitrogen as a post-deposition strategy to improve polycrystalline TiN films grown by RF-biased plasma-enhanced atomic layer deposition. Grazing-incidence X-ray diffraction reveals reduced peak broadening, a smaller lattice parameter, and a stronger (111) preferred orientation with increasing annealing temperature. X-ray photoelectron spectroscopy depth profiling shows reduced oxygen-related bonding and a shift toward a Ti--N-dominated chemical environment after annealing. These structural and chemical changes result in a 25% increase in the superconducting transition temperature and a significant narrowing of the transition width. Annealing also reduced the sheet resistance and the estimated sheet kinetic inductance, increased the residual resistance ratio, and improved the magnetic-field tolerance. Together, the structural, chemical, and transport results are consistent with reduced material disorder and improved superconducting uniformity. Because RTA is a relatively low thermal budget and is a semiconductor fabrication compatible process, it offers a practical route to improve the quality of ALD-grown TiN for superconducting applications.",
  "abstract_shown": true,
  "affiliations": [],
  "article_type": null,
  "arxiv": "2611.00424",
  "author_total": 8,
  "authors": [
    {
      "name": "Z. Sadirkhanov"
    },
    {
      "name": "A. Tuigynbek"
    },
    {
      "name": "M. Surendran"
    },
    {
      "name": "A. Jakyp"
    },
    {
      "name": "L. Akisheva"
    },
    {
      "name": "A. T. Hammack"
    },
    {
      "name": "A. B. Tikhonov"
    },
    {
      "name": "A. Kemelbay"
    }
  ],
  "bibtex": "https://research.draconitic.com/paper/dtsv9p78tcc3j.bib",
  "cited_by": 0,
  "doi": "10.48550/arxiv.2611.00424",
  "fulltext_url": null,
  "id": "dtsv9p78tcc3j",
  "issns": [],
  "landing_url": "https://arxiv.org/abs/2611.00424",
  "language": null,
  "licence": "CC-BY-NC-ND-4.0",
  "licence_label": "CC BY-NC-ND 4.0",
  "licence_source": "article",
  "licence_url": "http://creativecommons.org/licenses/by-nc-nd/4.0/",
  "metadata_licence": "CC0-1.0",
  "native_subjects": [
    [
      "arxiv",
      "cond-mat.supr-con"
    ]
  ],
  "openalex": null,
  "pdf_url": "https://arxiv.org/pdf/2611.00424",
  "pmcid": null,
  "pmid": null,
  "published": "2026-11-01",
  "publisher": null,
  "ris": "https://research.draconitic.com/paper/dtsv9p78tcc3j.ris",
  "sources": [
    {
      "first_seen": "2026-11-03T12:20:59Z",
      "native_id": "2611.00424",
      "source": "arxiv",
      "url": "https://arxiv.org/abs/2611.00424"
    }
  ],
  "subjects": [
    {
      "field": "physics",
      "origin": "arxiv:cond-mat.supr-con",
      "subfield": "condensed-matter"
    }
  ],
  "title": "Effect of Rapid Thermal Annealing on the Superconductivity of ALD-Grown TiN thin films",
  "title_text": "Effect of Rapid Thermal Annealing on the Superconductivity of ALD-Grown TiN thin films",
  "type": "preprint",
  "updated_at": "2026-11-05T15:20:18Z",
  "url": "https://research.draconitic.com/paper/dtsv9p78tcc3j",
  "venue": "arXiv",
  "versions": []
}