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Peer-reviewedCC BY 4.0Advanced Materials

Metal Oxide Nano-Interface Boosting the Deep Ultraviolet Adjustable Noise-Filtering In-Sensor Computing

Abstract

Long-afterglow light-emitting devices (LALEDs), which combine the capabilities of sensing, memory, processing, and display integration, allow for the simultaneous implementation of optical and electrical in-sensor computing. However, the inherently low conductivity of conventional deep-ultraviolet (DUV) responsive materials hinders their use in the DUV-responsive LALEDs (DUV-LALEDs). Herein, we demonstrate that sol-gel-fractured indium-magnesium oxide (InMgO) concurrently exhibits ideal nano-interface for DUV photon absorption and semiconductor crystal for efficient charge transport via hopping, enabling to reach high mobility (0.6 cm2 V−1 s−1), excellent memory dynamic range (70 dB), and responsivity (523.7 A/W). The InMgO-based DUV-LALEDs display an electrical and optical post-synaptic output when irradiated with DUV light. Moreover, hardware-level noise-filtering processes to the pre-synaptic weight are revealed in the DUV-LALEDs, emerging as the inhibition of light emission due to the insufficient post-synaptic charge injection from the channel layer. Consequently, an adjustable noise-filtering in-sensor computing is successfully achieved by modulating the channel length. By taking advantage of the DUV-LALED multifunctional nature, fusion-node reservoir computing networks are employed to accomplish multi-dimensional recognition tasks, displaying a high recognition accuracy of 99%. These findings demonstrate that the joint materials and devices optimization is a powerful strategy for fabricating cost-efficient DUV analytical chips.

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BibTeX
@article{ju2026metal,
  title = {{Metal Oxide Nano-Interface Boosting the Deep Ultraviolet Adjustable Noise-Filtering In-Sensor Computing}},
  author = {Zhongshi Ju and Peng Li and Jingsong Yuan and Boyuan Yu and Bin Han and Yusheng Chen and Jiangang Ma and Haiyang Xu and Yichun Liu and Paolo Samorì},
  journal = {Advanced Materials},
  year = {2026},
  month = aug,
  doi = {10.1002/adma.74481},
  url = {https://univoak.hal.science/hal-05842257v1},
  note = {CC BY 4.0},
}
RIS
TY  - JOUR
TI  - Metal Oxide Nano-Interface Boosting the Deep Ultraviolet Adjustable Noise-Filtering In-Sensor Computing
AU  - Zhongshi Ju
AU  - Peng Li
AU  - Jingsong Yuan
AU  - Boyuan Yu
AU  - Bin Han
AU  - Yusheng Chen
AU  - Jiangang Ma
AU  - Haiyang Xu
AU  - Yichun Liu
AU  - Paolo Samorì
PY  - 2026
DA  - 2026/08/06
JO  - Advanced Materials
DO  - 10.1002/adma.74481
UR  - https://univoak.hal.science/hal-05842257v1
AB  - Long-afterglow light-emitting devices (LALEDs), which combine the capabilities of sensing, memory, processing, and display integration, allow for the simultaneous implementation of optical and electrical in-sensor computing. However, the inherently low conductivity of conventional deep-ultraviolet (DUV) responsive materials hinders their use in the DUV-responsive LALEDs (DUV-LALEDs). Herein, we demonstrate that sol-gel-fractured indium-magnesium oxide (InMgO) concurrently exhibits ideal nano-interface for DUV photon absorption and semiconductor crystal for efficient charge transport via hopping, enabling to reach high mobility (0.6 cm2 V−1 s−1), excellent memory dynamic range (70 dB), and responsivity (523.7 A/W). The InMgO-based DUV-LALEDs display an electrical and optical post-synaptic output when irradiated with DUV light. Moreover, hardware-level noise-filtering processes to the pre-synaptic weight are revealed in the DUV-LALEDs, emerging as the inhibition of light emission due to the insufficient post-synaptic charge injection from the channel layer. Consequently, an adjustable noise-filtering in-sensor computing is successfully achieved by modulating the channel length. By taking advantage of the DUV-LALED multifunctional nature, fusion-node reservoir computing networks are employed to accomplish multi-dimensional recognition tasks, displaying a high recognition accuracy of 99%. These findings demonstrate that the joint materials and devices optimization is a powerful strategy for fabricating cost-efficient DUV analytical chips.
SN  - 0935-9648
SN  - 1521-4095
ER  -