Phonon down-conversion by normal metals for superconducting devices
Abstract
Thanks to low dissipation, superconducting devices are promising for a number of applications, such as detectors and implementations of quantum computation. However, their working can be adversely impacted by quasiparticles, which is why so-called quasiparticle poisoning mechanisms and their mitigation are under intense investigation. Here we focus on one poisoning mechanism, namely pair-breaking phonons, and its mitigation through down-conversion by a normal-metal film - the process in which scattering of high-energy phonons by electrons lowers the energy of the former below the pair-breaking threshold. To study the down-conversion, we introduce a model based on kinetic equations, which we solve both analytically (approximately) and numerically in the steady state. We use the solution to the estimate a properly-defined down-conversion efficiency which depends on material parameters (such as the strength of electron-phonon interaction and the phonon transmission coefficient at interfaces) and film and substrate thicknesses. Interestingly, we find that the efficiency is nearly optimal above a minimum metal thickness, typically between 50 and 500 nm depending on the metal-substrate combination.
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BibTeX
@misc{magna2026phonon,
title = {{Phonon down-conversion by normal metals for superconducting devices}},
author = {Guglielmo La Magna and Gianluigi Catelani},
howpublished = {arXiv},
year = {2026},
month = oct,
doi = {10.48550/arxiv.2607.13870},
eprint = {2607.13870},
archivePrefix = {arXiv},
url = {https://arxiv.org/abs/2607.13870},
}
RIS
TY - UNPB
TI - Phonon down-conversion by normal metals for superconducting devices
AU - Guglielmo La Magna
AU - Gianluigi Catelani
PY - 2026
DA - 2026/10/28
PB - arXiv
DO - 10.48550/arxiv.2607.13870
UR - https://arxiv.org/abs/2607.13870
AB - Thanks to low dissipation, superconducting devices are promising for a number of applications, such as detectors and implementations of quantum computation. However, their working can be adversely impacted by quasiparticles, which is why so-called quasiparticle poisoning mechanisms and their mitigation are under intense investigation. Here we focus on one poisoning mechanism, namely pair-breaking phonons, and its mitigation through down-conversion by a normal-metal film - the process in which scattering of high-energy phonons by electrons lowers the energy of the former below the pair-breaking threshold. To study the down-conversion, we introduce a model based on kinetic equations, which we solve both analytically (approximately) and numerically in the steady state. We use the solution to the estimate a properly-defined down-conversion efficiency which depends on material parameters (such as the strength of electron-phonon interaction and the phonon transmission coefficient at interfaces) and film and substrate thicknesses. Interestingly, we find that the efficiency is nearly optimal above a minimum metal thickness, typically between 50 and 500 nm depending on the metal-substrate combination.
ER -