Narrow-Line-Width Electroluminescence in Monolayer WSe2 Enabled by a Sub-5 nm Au/Pt Nanogap.
6 affiliations
- 1Electrical Engineering and Computer Sciences, University of California, Berkeley, Berkeley, California94720, United States.
- 2Materials and Structures Laboratory, Institute of Science Tokyo, Yokohama2268503, Japan.
- 3Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California94720, United States.
- 4The Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California94720, United States.
- 5Kavli Energy NanoScience Institute at the University of California, Berkeley, Berkeley, California94720, United States.
- 6Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, California94720, United States.
Abstract
Spectrally isolated, electrically driven emission from localized states in two-dimensional semiconductors remains challenging in scalable planar devices. Here, we report narrow-line-width alternating-current electroluminescence (ACEL) from localized states in monolayer WSe2 using a lithographically defined sub-5 nm Au/Pt nanogap on SiO2/Si at 3.5 K. The curved nanogap geometry produces a nonuniform strain landscape and regions of enhanced electric field that may influence the local electronic environment. Under square-wave gate excitation, the device exhibits a spectrally isolated ACEL line at 1.652 eV with an apparent fitted line width of approximately 2 meV, in contrast to broad, multipeak photoluminescence from the same device. Spectral decomposition identifies dominant ZPL-like and weaker red-shifted sideband-like contributions. This nanogap architecture provides a scalable planar platform for narrow-line-width, electrically driven localized emission in two-dimensional materials.
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BibTeX
@article{miao2026narrowlinewidth,
title = {{Narrow-Line-Width Electroluminescence in Monolayer WSe2 Enabled by a Sub-5 nm Au/Pt Nanogap.}},
author = {Shurong Miao and I K M Reaz Rahman and Aditya Nirmale and Inha Kim and Dorottya Urmossy and Thomas P Darlington and Harishankar Jayakumar and Seiichiro Izawa and Archana Raja and Daryl C Chrzan and Yutaka Majima and Ali Javey},
journal = {Nano letters},
year = {2026},
month = oct,
doi = {10.1021/acs.nanolett.6c03133},
url = {https://europepmc.org/article/MED/42917054},
note = {CC BY},
}
RIS
TY - JOUR
TI - Narrow-Line-Width Electroluminescence in Monolayer WSe2 Enabled by a Sub-5 nm Au/Pt Nanogap.
AU - Shurong Miao
AU - I K M Reaz Rahman
AU - Aditya Nirmale
AU - Inha Kim
AU - Dorottya Urmossy
AU - Thomas P Darlington
AU - Harishankar Jayakumar
AU - Seiichiro Izawa
AU - Archana Raja
AU - Daryl C Chrzan
AU - Yutaka Majima
AU - Ali Javey
PY - 2026
DA - 2026/10/01
JO - Nano letters
DO - 10.1021/acs.nanolett.6c03133
UR - https://europepmc.org/article/MED/42917054
AB - Spectrally isolated, electrically driven emission from localized states in two-dimensional semiconductors remains challenging in scalable planar devices. Here, we report narrow-line-width alternating-current electroluminescence (ACEL) from localized states in monolayer WSe2 using a lithographically defined sub-5 nm Au/Pt nanogap on SiO2/Si at 3.5 K. The curved nanogap geometry produces a nonuniform strain landscape and regions of enhanced electric field that may influence the local electronic environment. Under square-wave gate excitation, the device exhibits a spectrally isolated ACEL line at 1.652 eV with an apparent fitted line width of approximately 2 meV, in contrast to broad, multipeak photoluminescence from the same device. Spectral decomposition identifies dominant ZPL-like and weaker red-shifted sideband-like contributions. This nanogap architecture provides a scalable planar platform for narrow-line-width, electrically driven localized emission in two-dimensional materials.
SN - 1530-6984
SN - 1530-6992
ER -