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Peer-reviewedPublisher termsOptics Express

Polarization aberrations in EUV projection objectives: effects of numerical aperture and illumination incidence angle

  • Boyuan Meng1,2
  • Jingaowa Hu2
  • Xuefeng Zeng1,2
  • Yang Liu1,2
  • Wenyan Li2
  • Lingjie Wang1,2
  • Pengbo Wang1,2
  1. 1University of Chinese Academy of Sciences
  2. 2State Key Laboratory of Advanced Manufacturing for Optical Systems
Open at sourceDOICite

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Cite

BibTeXRIS
BibTeX
@article{meng2026polarization,
  title = {{Polarization aberrations in EUV projection objectives: effects of numerical aperture and illumination incidence angle}},
  author = {Boyuan Meng and Jingaowa Hu and Xuefeng Zeng and Yang Liu and Wenyan Li and Lingjie Wang and Pengbo Wang},
  journal = {Optics Express},
  year = {2026},
  month = oct,
  doi = {10.1364/oe.616344},
  url = {https://opg.optica.org/abstract.cfm?URI=oe-34-22-40992},
}
RIS
TY  - JOUR
TI  - Polarization aberrations in EUV projection objectives: effects of numerical aperture and illumination incidence angle
AU  - Boyuan Meng
AU  - Jingaowa Hu
AU  - Xuefeng Zeng
AU  - Yang Liu
AU  - Wenyan Li
AU  - Lingjie Wang
AU  - Pengbo Wang
PY  - 2026
DA  - 2026/10/19
JO  - Optics Express
DO  - 10.1364/oe.616344
UR  - https://opg.optica.org/abstract.cfm?URI=oe-34-22-40992
SN  - 1094-4087
ER  -