Polarization-Multiplexed Holography Based on Dielectric Metasurfaces.
- 1School of Opto-Electronical Engineering, Xi'an Technological University, Xi'an 710021, China.
- 2Xi'an North Electro-Optic Science & Technology Defense Co., Ltd., Xi'an 710043, China.
Abstract
We present a silicon-nanobrick metasurface for dual-channel polarization-multiplexed holography at 1.55 μm. A Jones-matrix design combined with a Fresnel-based Gerchberg-Saxton algorithm maps the target phase profiles to nanobrick dimensions and orientations, enabling combined propagation-phase and geometric-phase control. Numerical simulations demonstrate holographic reconstruction for orthogonal linear, circular, and elliptical polarization pairs. The selected meta-atoms exhibit simulated power transmittances above 70% along both principal axes under periodic boundary conditions. The circular-polarization design is fabricated using electron beam lithography and hard-mask etching, and polarization-selective far-field reconstruction is experimentally observed. Further numerical analysis demonstrates continuous variation of the relative reconstructed intensities along an incident-polarization trajectory. Under an ideal collection and analyzer model, separately optimized elliptical analyzers provide central-signal suppression of 19.02 and 18.78 dB while retaining 64.30% and 61.71% of the corresponding target-image signals. An additional simulated design reconstructs two images within the same spatial region, yielding polarization-channel extinction ratios of 9.30 and 9.33 dB under fixed circular-analyzer conditions. These results demonstrate a silicon-based implementation of dual-channel holographic encoding and provide quantitative characterization of polarization-selective readout.
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BibTeX
@article{he2026polarizationmultiplexed,
title = {{Polarization-Multiplexed Holography Based on Dielectric Metasurfaces.}},
author = {Chen He and Xizhi Wan and Jingyao Hou and Ziyu Tian and Wang Wang and Nian Kang and Shun Zhou and Xueping Sun},
journal = {Micromachines},
year = {2026},
month = oct,
doi = {10.3390/mi17101179},
url = {https://europepmc.org/article/MED/42943936},
note = {CC BY},
}
RIS
TY - JOUR
TI - Polarization-Multiplexed Holography Based on Dielectric Metasurfaces.
AU - Chen He
AU - Xizhi Wan
AU - Jingyao Hou
AU - Ziyu Tian
AU - Wang Wang
AU - Nian Kang
AU - Shun Zhou
AU - Xueping Sun
PY - 2026
DA - 2026/10/11
JO - Micromachines
DO - 10.3390/mi17101179
UR - https://europepmc.org/article/MED/42943936
AB - We present a silicon-nanobrick metasurface for dual-channel polarization-multiplexed holography at 1.55 μm. A Jones-matrix design combined with a Fresnel-based Gerchberg-Saxton algorithm maps the target phase profiles to nanobrick dimensions and orientations, enabling combined propagation-phase and geometric-phase control. Numerical simulations demonstrate holographic reconstruction for orthogonal linear, circular, and elliptical polarization pairs. The selected meta-atoms exhibit simulated power transmittances above 70% along both principal axes under periodic boundary conditions. The circular-polarization design is fabricated using electron beam lithography and hard-mask etching, and polarization-selective far-field reconstruction is experimentally observed. Further numerical analysis demonstrates continuous variation of the relative reconstructed intensities along an incident-polarization trajectory. Under an ideal collection and analyzer model, separately optimized elliptical analyzers provide central-signal suppression of 19.02 and 18.78 dB while retaining 64.30% and 61.71% of the corresponding target-image signals. An additional simulated design reconstructs two images within the same spatial region, yielding polarization-channel extinction ratios of 9.30 and 9.33 dB under fixed circular-analyzer conditions. These results demonstrate a silicon-based implementation of dual-channel holographic encoding and provide quantitative characterization of polarization-selective readout.
SN - 2072-666X
ER -