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Peer-reviewedLicence not statedAdvanced Materials

MOF‐Derived FeNi/C Composites Constructed by Controlled Etching for High‐Performance Electromagnetic Wave Absorption

  • Lvtong Duan1
  • 贾金凯1
  • J H Liu1
  • Y Q Liu1
  • Weimeng Chu2,3
  • Jintang Zhou1
  • Jiaqi Tao4
  • Yi Yan1
  • W H Wang1
  • Zhenyu Cheng1
  • Yue Wang1
  • Wenjian Zheng5
3 more authors
  • Haiyan Zhuang6
  • Tianjing Huang7
  • Zhengjun Yao1
7 affiliations
  1. 1College of Materials Science and Technology Nanjing University of Aeronautics and Astronautics Nanjing China
  2. 2Department of Mechanical Engineering National University of Singapore Singapore Singapore
  3. 3School of Aeronautics and Astronautics Sun Yat‐Sen University Shenzhen China
  4. 4School of Materials Science and Engineering Nanyang Technological University Singapore Singapore
  5. 5Suzhou Laboratory Suzhou China
  6. 6National Key Laboratory of Marine Corrosion and Protection Luoyang Ship Material Research Institute Xiamen China
  7. 7Yangzhou Sparkle Industry Co., Ltd. Yangzhou China
Open at sourceDOICite

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Cite

BibTeXRIS
BibTeX
@article{duan2026mofderived,
  title = {{MOF‐Derived FeNi/C Composites Constructed by Controlled Etching for High‐Performance Electromagnetic Wave Absorption}},
  author = {Lvtong Duan and 贾金凯 and J H Liu and Y Q Liu and Weimeng Chu and Jintang Zhou and Jiaqi Tao and Yi Yan and W H Wang and Zhenyu Cheng and Yue Wang and Wenjian Zheng and Haiyan Zhuang and Tianjing Huang and Zhengjun Yao},
  journal = {Advanced Materials},
  year = {2026},
  month = jul,
  doi = {10.1002/adma.73983},
  url = {https://pmc.ncbi.nlm.nih.gov/articles/PMC13471824/},
}
RIS
TY  - JOUR
TI  - MOF‐Derived FeNi/C Composites Constructed by Controlled Etching for High‐Performance Electromagnetic Wave Absorption
AU  - Lvtong Duan
AU  - 贾金凯
AU  - J H Liu
AU  - Y Q Liu
AU  - Weimeng Chu
AU  - Jintang Zhou
AU  - Jiaqi Tao
AU  - Yi Yan
AU  - W H Wang
AU  - Zhenyu Cheng
AU  - Yue Wang
AU  - Wenjian Zheng
AU  - Haiyan Zhuang
AU  - Tianjing Huang
AU  - Zhengjun Yao
PY  - 2026
DA  - 2026/07/09
JO  - Advanced Materials
DO  - 10.1002/adma.73983
UR  - https://pmc.ncbi.nlm.nih.gov/articles/PMC13471824/
SN  - 0935-9648
SN  - 1521-4095
ER  -