Production of a Titanium Ion Beam Using Fluorides and Fluorine-Forming Precursors in an ECR Ion Source

Abstract

The production of multiply charged titanium ions is of significant interest for accelerator-based experiments, surface modification technologies, and applications in nuclear physics. Due to the low saturated vapor pressure of titanium at temperatures below 1000 °C, the generation of titanium ion beams from an electron cyclotron resonance ion source (ECRIS) remains a challenging task. The choice of titanium vapor injection methods into the ECR plasma plays a key role in achieving high ionization efficiency, plasma stability, and reliable long-term source operation. In this work, alternative approaches for the injection of neutral titanium atoms into the ECR plasma are investigated, focusing on the use of fluorine-containing compounds. Titanium fluorides (TiF3, TiF4) possess a relatively high saturated vapor pressure at moderate temperatures, allowing to use standard resistively heated ovens operating up to 1000 °C. Another method involves the in-situ formation of titanium fluorides inside the plasma chamber via chemical reactions between metal titanium and the dissociation products of sulfur hexafluoride (SF6). These approaches enable controlled and efficient titanium injection into the ECRIS plasma with satisfactory extracted ion beam stability.

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BibTeX RIS

BibTeX

@misc{pugachev2026production,
  title = {{Production of a Titanium Ion Beam Using Fluorides and Fluorine-Forming Precursors in an ECR Ion Source}},
  author = {D. K. Pugachev and K. I. Berestov and A. E. Bondarchenko and V. N. Loginov and A. N. Lebedev and E. Yu. Kidanova and K. I. Kuzmenkov and V. E. Mironov and D. S. Podoinikov and D. S. Yakovlev},
  howpublished = {arXiv},
  year = {2026},
  month = sep,
  doi = {10.48550/arxiv.2609.29391},
  eprint = {2609.29391},
  archivePrefix = {arXiv},
  url = {https://arxiv.org/abs/2609.29391},
  note = {CC BY 4.0},
}

RIS

TY  - UNPB
TI  - Production of a Titanium Ion Beam Using Fluorides and Fluorine-Forming Precursors in an ECR Ion Source
AU  - D. K. Pugachev
AU  - K. I. Berestov
AU  - A. E. Bondarchenko
AU  - V. N. Loginov
AU  - A. N. Lebedev
AU  - E. Yu. Kidanova
AU  - K. I. Kuzmenkov
AU  - V. E. Mironov
AU  - D. S. Podoinikov
AU  - D. S. Yakovlev
PY  - 2026
DA  - 2026/09/24
PB  - arXiv
DO  - 10.48550/arxiv.2609.29391
UR  - https://arxiv.org/abs/2609.29391
AB  - The production of multiply charged titanium ions is of significant interest for accelerator-based experiments, surface modification technologies, and applications in nuclear physics. Due to the low saturated vapor pressure of titanium at temperatures below 1000 °C, the generation of titanium ion beams from an electron cyclotron resonance ion source (ECRIS) remains a challenging task. The choice of titanium vapor injection methods into the ECR plasma plays a key role in achieving high ionization efficiency, plasma stability, and reliable long-term source operation. In this work, alternative approaches for the injection of neutral titanium atoms into the ECR plasma are investigated, focusing on the use of fluorine-containing compounds. Titanium fluorides (TiF3, TiF4) possess a relatively high saturated vapor pressure at moderate temperatures, allowing to use standard resistively heated ovens operating up to 1000 °C. Another method involves the in-situ formation of titanium fluorides inside the plasma chamber via chemical reactions between metal titanium and the dissociation products of sulfur hexafluoride (SF6). These approaches enable controlled and efficient titanium injection into the ECRIS plasma with satisfactory extracted ion beam stability.
ER  -

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