Peer-reviewedCC BYPolymers
A Study on Polymer Dispersants in CMP Ceria Slurry for the Polysilicon Film Removal Suppression
- 1Department of Nanomaterials and Semiconductor, Hannam University, Daejeon 34430, Republic of Korea
- 2Department of Chemistry, Hannam University, Daejeon 34430, Republic of Korea
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BibTeX
@article{cho2026study,
title = {{A Study on Polymer Dispersants in CMP Ceria Slurry for the Polysilicon Film Removal Suppression}},
author = {Jaeyeong Cho and Seyoung Ahn and Sohee Hwang and Woonjung Kim},
journal = {Polymers},
year = {2026},
month = sep,
url = {https://europepmc.org/article/PMC/PMC13666849},
note = {CC BY},
}
RIS
TY - JOUR
TI - A Study on Polymer Dispersants in CMP Ceria Slurry for the Polysilicon Film Removal Suppression
AU - Jaeyeong Cho
AU - Seyoung Ahn
AU - Sohee Hwang
AU - Woonjung Kim
PY - 2026
DA - 2026/09/24
JO - Polymers
UR - https://europepmc.org/article/PMC/PMC13666849
SN - 2073-4360
ER -