Determination of van der Waals thin film thickness via characteristic X-ray photon yield
Abstract
Characteristic X ray generation is essential for producing X ray sources and for investigating light matter interactions. Here, we demonstrate that characteristic X ray generation can also be employed to determine the thickness of van der Waals thin films in a non destructive manner. Specifically, we establish a sixth order polynomial model that relates film thickness to the characteristic X ray yield. The model can both predict the X ray yield of graphite films at arbitrary thicknesses and infer the film thickness from a corresponding characteristic X ray yield. We validate the model by comparing its predicted X ray yields for graphite films with those obtained from Monte Carlo simulations. Additionally, we experimentally validated the reliability and feasibility of the proposed method for extracting graphite film thickness via X ray photon yield characterization. Our results provide a non destructive approach for determining the thickness of van der Waals thin films.
Related
- Testing Van der Waals black holes using black hole photon rings
- First-Principles Determination of the QCD Contribution to the Axion-Photon Coupling Using Domain-Wall Fermions
- Infrared behavior of the photon yield in nonlinear Compton scattering
- High-resolution spectroscopic study of the H2O–CO2 van der Waals complex in the 2OH overtone range
- Topological diversity and scintillating dynamics of dipolar surface twists in a van der Waals magnet
BibTeX
@misc{luo2026determination,
title = {{Determination of van der Waals thin film thickness via characteristic X-ray photon yield}},
author = {Guoshun Luo and Shichao Zhao and Xinyu Liu and Suguo Chen and Yue Wang and Ping Zhang and Zhigang Lu and Shaomeng Wang and Sunchao Huang and Yubin Gong},
howpublished = {arXiv},
year = {2026},
month = oct,
doi = {10.48550/arxiv.2610.01309},
eprint = {2610.01309},
archivePrefix = {arXiv},
url = {https://arxiv.org/abs/2610.01309},
note = {CC BY-SA 4.0},
}
RIS
TY - UNPB
TI - Determination of van der Waals thin film thickness via characteristic X-ray photon yield
AU - Guoshun Luo
AU - Shichao Zhao
AU - Xinyu Liu
AU - Suguo Chen
AU - Yue Wang
AU - Ping Zhang
AU - Zhigang Lu
AU - Shaomeng Wang
AU - Sunchao Huang
AU - Yubin Gong
PY - 2026
DA - 2026/10/01
PB - arXiv
DO - 10.48550/arxiv.2610.01309
UR - https://arxiv.org/abs/2610.01309
AB - Characteristic X ray generation is essential for producing X ray sources and for investigating light matter interactions. Here, we demonstrate that characteristic X ray generation can also be employed to determine the thickness of van der Waals thin films in a non destructive manner. Specifically, we establish a sixth order polynomial model that relates film thickness to the characteristic X ray yield. The model can both predict the X ray yield of graphite films at arbitrary thicknesses and infer the film thickness from a corresponding characteristic X ray yield. We validate the model by comparing its predicted X ray yields for graphite films with those obtained from Monte Carlo simulations. Additionally, we experimentally validated the reliability and feasibility of the proposed method for extracting graphite film thickness via X ray photon yield characterization. Our results provide a non destructive approach for determining the thickness of van der Waals thin films.
ER -