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PreprintCC BY 4.0arXiv

Thermal response of an in-situ STEM MEMS chip under rapid pulse heating

Abstract

In-situ rapid solidification studies demand measurements of thermal histories with high temporal resolution. We present a simple, effective setup to quantify the cooling response of an uncoated commercial Protochips Fusion MEMS chip in an in-situ scanning transmission electron microscopy (STEM) context. We drive user-defined temperature programs via an arbitrary waveform generator (AWG), while recording the voltage drops across a series shunt to reconstruct chip resistance and temperature at sub-millisecond resolution. We confirm the response times inferred from the current; however, the temperature obtained from the physically linked resistance, T(R), evolves more slowly. Analysis of the maximum cooling step reveals an exponential-like relaxation with time constant τ=1.80 ms, consistent with reported thermal lag constants for fast scanning calorimetry. From the time to reach 95% of the temperature difference ΔT, we measure an average cooling rate of ≈ 7.9× 104 K/s. Robustness checks include repeated R(T) measurements (revealing a modest downward drift approaching an asymptote), a 10 kΩ test load, and characterization of small off-duty arbitrary waveform generator leakage/offsets. These findings define practical bounds on achievable thermal-path rates when planning in-situ electron microscopy experiments with this chip platform.

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BibTeX
@misc{dumitraschkewitz2026thermal,
  title = {{Thermal response of an in-situ STEM MEMS chip under rapid pulse heating}},
  author = {Phillip Dumitraschkewitz and Thomas Kremmer},
  howpublished = {arXiv},
  year = {2026},
  month = sep,
  doi = {10.48550/arxiv.2609.08473},
  eprint = {2609.08473},
  archivePrefix = {arXiv},
  url = {https://arxiv.org/abs/2609.08473},
  note = {CC BY 4.0},
}
RIS
TY  - UNPB
TI  - Thermal response of an in-situ STEM MEMS chip under rapid pulse heating
AU  - Phillip Dumitraschkewitz
AU  - Thomas Kremmer
PY  - 2026
DA  - 2026/09/08
PB  - arXiv
DO  - 10.48550/arxiv.2609.08473
UR  - https://arxiv.org/abs/2609.08473
AB  - In-situ rapid solidification studies demand measurements of thermal histories with high temporal resolution. We present a simple, effective setup to quantify the cooling response of an uncoated commercial Protochips Fusion MEMS chip in an in-situ scanning transmission electron microscopy (STEM) context. We drive user-defined temperature programs via an arbitrary waveform generator (AWG), while recording the voltage drops across a series shunt to reconstruct chip resistance and temperature at sub-millisecond resolution. We confirm the response times inferred from the current; however, the temperature obtained from the physically linked resistance, T(R), evolves more slowly. Analysis of the maximum cooling step reveals an exponential-like relaxation with time constant τ=1.80 ms, consistent with reported thermal lag constants for fast scanning calorimetry. From the time to reach 95% of the temperature difference ΔT, we measure an average cooling rate of ≈ 7.9× 10^4 K/s. Robustness checks include repeated R(T) measurements (revealing a modest downward drift approaching an asymptote), a 10 kΩ test load, and characterization of small off-duty arbitrary waveform generator leakage/offsets. These findings define practical bounds on achievable thermal-path rates when planning in-situ electron microscopy experiments with this chip platform.
ER  -