Super-resolution technique enabled by higher-order Bessel beams in nanoscale optical structures
Abstract
In conventional optical microscopy, accessing subwavelength information is classically constrained by the Abbe diffraction limit which remains a significant challenge in nanophotonics. To overcome this limitation, we introduce a scheme that generates a tightly confined near-field focal spot under non-diffracting Bessel beam illumination, employing a series of high refractive-index nanoscale structures. Furthermore, the utilization of higher-order Bessel beams enables additional resolution enhancement beyond the diffraction limit. Our results demonstrate that the pyramidal nanostructure can generate a highly localized near-field confinement with a characteristic width of 10 nm, enabling subwavelength optical intensity localization. To elucidate the factors governing the localization behaviour, we systematically investigate the influence of different geometrical parameters related to the incident Bessel beam on the near field localization and shows that these factors critically determine the stability and spatial profile of the focal spot. These findings highlight the potential of the proposed approach for various applications in super-resolution techniques and quantum technology.
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BibTeX
@misc{apoorva2026superresolution,
title = {{Super-resolution technique enabled by higher-order Bessel beams in nanoscale optical structures}},
author = {Apoorva D and M Ummal Momeen},
howpublished = {arXiv},
year = {2026},
month = oct,
doi = {10.48550/arxiv.2607.17458},
eprint = {2607.17458},
archivePrefix = {arXiv},
url = {https://arxiv.org/abs/2607.17458},
}
RIS
TY - UNPB
TI - Super-resolution technique enabled by higher-order Bessel beams in nanoscale optical structures
AU - Apoorva D
AU - M Ummal Momeen
PY - 2026
DA - 2026/10/27
PB - arXiv
DO - 10.48550/arxiv.2607.17458
UR - https://arxiv.org/abs/2607.17458
AB - In conventional optical microscopy, accessing subwavelength information is classically constrained by the Abbe diffraction limit which remains a significant challenge in nanophotonics. To overcome this limitation, we introduce a scheme that generates a tightly confined near-field focal spot under non-diffracting Bessel beam illumination, employing a series of high refractive-index nanoscale structures. Furthermore, the utilization of higher-order Bessel beams enables additional resolution enhancement beyond the diffraction limit. Our results demonstrate that the pyramidal nanostructure can generate a highly localized near-field confinement with a characteristic width of 10 nm, enabling subwavelength optical intensity localization. To elucidate the factors governing the localization behaviour, we systematically investigate the influence of different geometrical parameters related to the incident Bessel beam on the near field localization and shows that these factors critically determine the stability and spatial profile of the focal spot. These findings highlight the potential of the proposed approach for various applications in super-resolution techniques and quantum technology.
ER -