Proximitized Topological Insulator Charge Island Fabricated via In Situ Multi-Angle Stencil Lithography.
- 1PGI-9, Forschungszentrum Jülich and JARA Jülich-Aachen Research Alliance, 52425Jülich, Germany.
Abstract
Hybrid superconductor-topological insulator (TI) nanostructures constitute a promising material platform for exploring proximity-induced superconductivity in systems with topologically protected surface states. A key obstacle has been the realization of clean and well-controlled superconductor-TI interfaces, as TI surfaces rapidly degrade under ambient conditions. Here, we introduce a fully in situ, multi-angle stencil lithography technique that enables the fabrication of proximitized charge islands in TIs. The approach combines selective area growth of (Bi,Sb)2Te3 nanoribbons with angle-controlled deposition of diffusion barriers, superconducting Al, and ultrathin oxide tunnel barriers, allowing scalable fabrication of hybrid nanostructures without post-growth processing. Low-temperature transport measurements reveal robust Coulomb blockade and a pronounced suppression of low-energy conductance, which vanishes with a magnetic field, consistent with proximity-induced superconductivity in the island. These results establish a versatile nanofabrication platform that enables access to previously unexplored TI-based hybrid quantum devices and opens new routes for investigating superconductivity in topological nanostructures.
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BibTeX
@article{frohn2026proximitized,
title = {{Proximitized Topological Insulator Charge Island Fabricated via In Situ Multi-Angle Stencil Lithography.}},
author = {Benedikt Frohn and Tobias Schmitt and Vanessa Serrano and Anne Schmidt and Michael Schleenvoigt and Albert Hertel and Benjamin Bennemann and Abdur Rehman Jalil and Detlev Grützmacher and Peter Schüffelgen},
journal = {Nano letters},
year = {2026},
month = oct,
doi = {10.1021/acs.nanolett.6c02350},
url = {https://europepmc.org/article/MED/42917066},
note = {CC BY},
}
RIS
TY - JOUR
TI - Proximitized Topological Insulator Charge Island Fabricated via In Situ Multi-Angle Stencil Lithography.
AU - Benedikt Frohn
AU - Tobias Schmitt
AU - Vanessa Serrano
AU - Anne Schmidt
AU - Michael Schleenvoigt
AU - Albert Hertel
AU - Benjamin Bennemann
AU - Abdur Rehman Jalil
AU - Detlev Grützmacher
AU - Peter Schüffelgen
PY - 2026
DA - 2026/10/01
JO - Nano letters
DO - 10.1021/acs.nanolett.6c02350
UR - https://europepmc.org/article/MED/42917066
AB - Hybrid superconductor-topological insulator (TI) nanostructures constitute a promising material platform for exploring proximity-induced superconductivity in systems with topologically protected surface states. A key obstacle has been the realization of clean and well-controlled superconductor-TI interfaces, as TI surfaces rapidly degrade under ambient conditions. Here, we introduce a fully in situ, multi-angle stencil lithography technique that enables the fabrication of proximitized charge islands in TIs. The approach combines selective area growth of (Bi,Sb)2Te3 nanoribbons with angle-controlled deposition of diffusion barriers, superconducting Al, and ultrathin oxide tunnel barriers, allowing scalable fabrication of hybrid nanostructures without post-growth processing. Low-temperature transport measurements reveal robust Coulomb blockade and a pronounced suppression of low-energy conductance, which vanishes with a magnetic field, consistent with proximity-induced superconductivity in the island. These results establish a versatile nanofabrication platform that enables access to previously unexplored TI-based hybrid quantum devices and opens new routes for investigating superconductivity in topological nanostructures.
SN - 1530-6984
SN - 1530-6992
ER -