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Peer-reviewedCC BYNano letters

Proximitized Topological Insulator Charge Island Fabricated via In Situ Multi-Angle Stencil Lithography.

  1. 1PGI-9, Forschungszentrum Jülich and JARA Jülich-Aachen Research Alliance, 52425Jülich, Germany.

Abstract

Hybrid superconductor-topological insulator (TI) nanostructures constitute a promising material platform for exploring proximity-induced superconductivity in systems with topologically protected surface states. A key obstacle has been the realization of clean and well-controlled superconductor-TI interfaces, as TI surfaces rapidly degrade under ambient conditions. Here, we introduce a fully in situ, multi-angle stencil lithography technique that enables the fabrication of proximitized charge islands in TIs. The approach combines selective area growth of (Bi,Sb)2Te3 nanoribbons with angle-controlled deposition of diffusion barriers, superconducting Al, and ultrathin oxide tunnel barriers, allowing scalable fabrication of hybrid nanostructures without post-growth processing. Low-temperature transport measurements reveal robust Coulomb blockade and a pronounced suppression of low-energy conductance, which vanishes with a magnetic field, consistent with proximity-induced superconductivity in the island. These results establish a versatile nanofabrication platform that enables access to previously unexplored TI-based hybrid quantum devices and opens new routes for investigating superconductivity in topological nanostructures.

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BibTeX
@article{frohn2026proximitized,
  title = {{Proximitized Topological Insulator Charge Island Fabricated via In Situ Multi-Angle Stencil Lithography.}},
  author = {Benedikt Frohn and Tobias Schmitt and Vanessa Serrano and Anne Schmidt and Michael Schleenvoigt and Albert Hertel and Benjamin Bennemann and Abdur Rehman Jalil and Detlev Grützmacher and Peter Schüffelgen},
  journal = {Nano letters},
  year = {2026},
  month = oct,
  doi = {10.1021/acs.nanolett.6c02350},
  url = {https://europepmc.org/article/MED/42917066},
  note = {CC BY},
}
RIS
TY  - JOUR
TI  - Proximitized Topological Insulator Charge Island Fabricated via In Situ Multi-Angle Stencil Lithography.
AU  - Benedikt Frohn
AU  - Tobias Schmitt
AU  - Vanessa Serrano
AU  - Anne Schmidt
AU  - Michael Schleenvoigt
AU  - Albert Hertel
AU  - Benjamin Bennemann
AU  - Abdur Rehman Jalil
AU  - Detlev Grützmacher
AU  - Peter Schüffelgen
PY  - 2026
DA  - 2026/10/01
JO  - Nano letters
DO  - 10.1021/acs.nanolett.6c02350
UR  - https://europepmc.org/article/MED/42917066
AB  - Hybrid superconductor-topological insulator (TI) nanostructures constitute a promising material platform for exploring proximity-induced superconductivity in systems with topologically protected surface states. A key obstacle has been the realization of clean and well-controlled superconductor-TI interfaces, as TI surfaces rapidly degrade under ambient conditions. Here, we introduce a fully in situ, multi-angle stencil lithography technique that enables the fabrication of proximitized charge islands in TIs. The approach combines selective area growth of (Bi,Sb)2Te3 nanoribbons with angle-controlled deposition of diffusion barriers, superconducting Al, and ultrathin oxide tunnel barriers, allowing scalable fabrication of hybrid nanostructures without post-growth processing. Low-temperature transport measurements reveal robust Coulomb blockade and a pronounced suppression of low-energy conductance, which vanishes with a magnetic field, consistent with proximity-induced superconductivity in the island. These results establish a versatile nanofabrication platform that enables access to previously unexplored TI-based hybrid quantum devices and opens new routes for investigating superconductivity in topological nanostructures.
SN  - 1530-6984
SN  - 1530-6992
ER  -