Near-field Ultrafast Nondiffractive Laser Nanoscale Cutting of Glass with Quasi-null Interface Roughness
Abstract
Generally, ultrafast laser glass dicing is governed by explosive material removal, which restricts the achievable surface roughness. Here we report single-step dicing of aluminosilicate glass with residual interface roughness below 5 nm, producing optical-quality surfaces without post-processing, using near-field-enhanced 0th-order Bessel-Gauss beams. This exceptional interface quality cannot be explained by a conventional laser ablation mechanism, such as phase explosion, melt expulsion, or fracture-dominated material removal. Instead, quantitative analysis of local thermal dynamics indicates that material removal is consistent with a Hertz-Knudsen-type evaporation process, enabling layer-by-layer removal with precision approaching a few molecular layers. These results suggest that nanoscale optical confinement fundamentally alters the response of transparent materials to ultrafast laser irradiation and establish a route toward deterministic laser processing with near-atomic precision.
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BibTeX
@misc{dwivedi2026nearfield,
title = {{Near-field Ultrafast Nondiffractive Laser Nanoscale Cutting of Glass with Quasi-null Interface Roughness}},
author = {Rajeev Dwivedi and Anton Rudenko and Guodong Zhang and Xxx Sedao and Yaya Lefkir and Ciro d'Amico and Guanghua Cheng and Razvan Stoian},
howpublished = {HAL},
year = {2026},
month = sep,
doi = {10.48550/arxiv.2609.39928},
eprint = {2609.39928},
archivePrefix = {arXiv},
url = {https://hal.science/hal-05802996v1},
note = {CC BY 4.0},
}
RIS
TY - UNPB
TI - Near-field Ultrafast Nondiffractive Laser Nanoscale Cutting of Glass with Quasi-null Interface Roughness
AU - Rajeev Dwivedi
AU - Anton Rudenko
AU - Guodong Zhang
AU - Xxx Sedao
AU - Yaya Lefkir
AU - Ciro d'Amico
AU - Guanghua Cheng
AU - Razvan Stoian
PY - 2026
DA - 2026/09/30
PB - HAL
DO - 10.48550/arxiv.2609.39928
UR - https://hal.science/hal-05802996v1
AB - Generally, ultrafast laser glass dicing is governed by explosive material removal, which restricts the achievable surface roughness. Here we report single-step dicing of aluminosilicate glass with residual interface roughness below 5 nm, producing optical-quality surfaces without post-processing, using near-field-enhanced 0th-order Bessel-Gauss beams. This exceptional interface quality cannot be explained by a conventional laser ablation mechanism, such as phase explosion, melt expulsion, or fracture-dominated material removal. Instead, quantitative analysis of local thermal dynamics indicates that material removal is consistent with a Hertz-Knudsen-type evaporation process, enabling layer-by-layer removal with precision approaching a few molecular layers. These results suggest that nanoscale optical confinement fundamentally alters the response of transparent materials to ultrafast laser irradiation and establish a route toward deterministic laser processing with near-atomic precision.
ER -