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Peer-reviewedCC BY 4.0Nanophotonics

Chiral Plasmonic Filtering in Silver Nanowires via Point‐Defect‐Induced Mode Conversion and Interference

  • Huijie Wang1
  • Yifan Chen1
  • Wei Dai1
  • Wenjun Zhang2
  • Wenqiang Wang2
  • Li Chen3
  • Zhiqiang Guan4
  • Hongxing Xu1,4
4 affiliations
  1. 1School of Physics and Technology Center for Nanoscience and Nanotechnology, and Key Laboratory of Artificial Micro and Nanostructures of Ministry of Education Wuhan University Wuhan China
  2. 2Institute of Physics Henan Academy of Sciences Zhengzhou China
  3. 3Institute of Light Resources and Environmental Science Henan Academy of Sciences Zhengzhou China
  4. 4Henan Academy of Sciences Zhengzhou China
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Abstract

Silver nanowire plasmonic waveguides offer subwavelength light confinement for integrated photonic circuits. Typically, chiral surface plasmon polariton control depends on excitation polarization. Here, we introduce a nanogroove point defect as a new regulatory dimension to realize on‐chip chiral filtering. Using finite‐difference time‐domain simulations together with scattering matrix method, we show that the nanogroove selectively couples the TM0 and HE−1 modes, and the filtering stems from constructive or destructive interference between direct transmission and mode‐converted pathways. With optimized geometry (depth: 45 nm, width: 55 nm), a chiral extinction ratio of 2.77 is achieved. Experimentally, a nanogroove fabricated via focused ion beam milling exhibits a measured chiral extinction ratio of 1.96, in good agreement with theoretical predictions. Furthermore, the scattering matrix method allows systematic investigation of the influence of defect number and spacing on the filtering performance, predicting an enhanced ratio of ∼3.7 for two optimally spaced defects. This work demonstrates point‐defect engineering as a compact, design‐ready strategy for on‐chip plasmonic devices.

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Cite

BibTeXRIS
BibTeX
@article{wang2026chiral,
  title = {{Chiral Plasmonic Filtering in Silver Nanowires via Point‐Defect‐Induced Mode Conversion and Interference}},
  author = {Huijie Wang and Yifan Chen and Wei Dai and Wenjun Zhang and Wenqiang Wang and Li Chen and Zhiqiang Guan and Hongxing Xu},
  journal = {Nanophotonics},
  year = {2026},
  month = nov,
  doi = {10.1002/nap2.70324},
  url = {https://doi.org/10.1002/nap2.70324},
  note = {CC BY 4.0},
}
RIS
TY  - JOUR
TI  - Chiral Plasmonic Filtering in Silver Nanowires via Point‐Defect‐Induced Mode Conversion and Interference
AU  - Huijie Wang
AU  - Yifan Chen
AU  - Wei Dai
AU  - Wenjun Zhang
AU  - Wenqiang Wang
AU  - Li Chen
AU  - Zhiqiang Guan
AU  - Hongxing Xu
PY  - 2026
DA  - 2026/11/05
JO  - Nanophotonics
DO  - 10.1002/nap2.70324
UR  - https://doi.org/10.1002/nap2.70324
AB  - Silver nanowire plasmonic waveguides offer subwavelength light confinement for integrated photonic circuits. Typically, chiral surface plasmon polariton control depends on excitation polarization. Here, we introduce a nanogroove point defect as a new regulatory dimension to realize on‐chip chiral filtering. Using finite‐difference time‐domain simulations together with scattering matrix method, we show that the nanogroove selectively couples the TM0 and HE−1 modes, and the filtering stems from constructive or destructive interference between direct transmission and mode‐converted pathways. With optimized geometry (depth: 45 nm, width: 55 nm), a chiral extinction ratio of 2.77 is achieved. Experimentally, a nanogroove fabricated via focused ion beam milling exhibits a measured chiral extinction ratio of 1.96, in good agreement with theoretical predictions. Furthermore, the scattering matrix method allows systematic investigation of the influence of defect number and spacing on the filtering performance, predicting an enhanced ratio of ∼3.7 for two optimally spaced defects. This work demonstrates point‐defect engineering as a compact, design‐ready strategy for on‐chip plasmonic devices.
SN  - 2192-8614
ER  -