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PreprintarXiv licencearXiv

BIC-Engineered Silicon Nitride Microring Resonators Enabled by an Etch-Free Laser-Writing Approach

Abstract

We report the initial experimental demonstration of a complementary, etch-free approach with fewer fabrication steps, in useful SU-8 ridges written by direct ultraviolet laser lithography on an unpatterned silicon nitride film define waveguides and microring resonators. Because the nitride film is never patterned, scattering at patterned nitride sidewalls does not arise, and the remaining radiative loss is engineered by design. The guided transverse-magnetic mode lies within the continuum of transverse-electric slab modes, and we use bound states in the continuum (BICs) as a design tool to control this radiation. Coupled-mode analysis and full-vectorial simulations show that radiation from the two ridge sidewalls cancels by destructive interference at discrete widths, with a first BIC at 2.25 micron and radiation below 1 dB/cm over a 0.3 micron width window and about 200 nm of bandwidth, and that curvature confines this cancellation to discrete bands of bending radius and width. Laser-written waveguides follow the predicted width dependence of the loss, reaching approximately 1.5 dB/cm near the BIC, where non-radiative loss dominates. A microring designed on a radius-selected BIC band exhibits loaded quality factors up to 1.6 \times 10^4 and, under the over-coupled assignment supported by a coupler model, an intrinsic quality factor of 3.3 \times 10^5. Because radiation is set by a patterned low-index layer on an unetched film, the same approach could be extended to other nanostructures. Optimization of the writing conditions and materials is ongoing.

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BibTeX
@misc{hajshahvaladi2026bicengineered,
  title = {{BIC-Engineered Silicon Nitride Microring Resonators Enabled by an Etch-Free Laser-Writing Approach}},
  author = {Leila Hajshahvaladi and Mohammad Amin Salmani and Media Abbasi and Mobin Yaghoobi and Mohammad Asgari and Gholam-Mohammad Parsanasab},
  howpublished = {arXiv},
  year = {2026},
  month = nov,
  doi = {10.48550/arxiv.2611.06167},
  eprint = {2611.06167},
  archivePrefix = {arXiv},
  url = {https://arxiv.org/abs/2611.06167},
}
RIS
TY  - UNPB
TI  - BIC-Engineered Silicon Nitride Microring Resonators Enabled by an Etch-Free Laser-Writing Approach
AU  - Leila Hajshahvaladi
AU  - Mohammad Amin Salmani
AU  - Media Abbasi
AU  - Mobin Yaghoobi
AU  - Mohammad Asgari
AU  - Gholam-Mohammad Parsanasab
PY  - 2026
DA  - 2026/11/04
PB  - arXiv
DO  - 10.48550/arxiv.2611.06167
UR  - https://arxiv.org/abs/2611.06167
AB  - We report the initial experimental demonstration of a complementary, etch-free approach with fewer fabrication steps, in useful SU-8 ridges written by direct ultraviolet laser lithography on an unpatterned silicon nitride film define waveguides and microring resonators. Because the nitride film is never patterned, scattering at patterned nitride sidewalls does not arise, and the remaining radiative loss is engineered by design. The guided transverse-magnetic mode lies within the continuum of transverse-electric slab modes, and we use bound states in the continuum (BICs) as a design tool to control this radiation. Coupled-mode analysis and full-vectorial simulations show that radiation from the two ridge sidewalls cancels by destructive interference at discrete widths, with a first BIC at 2.25 micron and radiation below 1 dB/cm over a 0.3 micron width window and about 200 nm of bandwidth, and that curvature confines this cancellation to discrete bands of bending radius and width. Laser-written waveguides follow the predicted width dependence of the loss, reaching approximately 1.5 dB/cm near the BIC, where non-radiative loss dominates. A microring designed on a radius-selected BIC band exhibits loaded quality factors up to 1.6 \times 10^4 and, under the over-coupled assignment supported by a coupler model, an intrinsic quality factor of 3.3 \times 10^5. Because radiation is set by a patterned low-index layer on an unetched film, the same approach could be extended to other nanostructures. Optimization of the writing conditions and materials is ongoing.
ER  -