Advanced N-Graphene-Based Electromagnetic Shields via Microwave Plasma Induced Synthesis
6 affiliations
- 1Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, Universidade de Lisboa, 1049-001 Lisboa, Portugal
- 2GTechPlasma, Instituto Superior Técnico, Av. Prof. Dr. Cavaco Silva, n.º 1, Porto Salvo, 2744-016 Lisboa, Portugal
- 3Faculty of Physics, Sofia University, 1164 Sofia, Bulgaria
- 4Department of Gaseous Electronics F6, Jožef Stefan Institute, Jamova cesta 39, SI-1000 Ljubljana, Slovenia
- 5Centro de Física e Investigação Tecnológica, Departamento de Física, Faculdade de Ciencias e Tecnologia, Universidade Nova de Lisboa, 2829-516 Caparica, Portugal
- 6Centre of Physics and Engineering of Advanced Materials, Instituto Superior Técnico, Universidade de Lisboa, 1049-001 Lisboa, Portugal
Abstract
Here, a plasma-enabled strategy is presented for the controllable fabrication of ultralight nanocomposites with absorption-dominated EM-shielding performance across the 5–70 GHz frequency range. The fabricated nanocomposites exhibit average microwave absorption exceeding 60% across the 5–25 GHz frequency range and 70% across the 25–70 GHz range while maintaining a constant thickness of 2 mm and a fixed filler content of 15 wt%. Plasma-driven nanoscale engineering and multiphase hybridization synergistically enhance dielectric and magnetic loss mechanisms, resulting in effective absorption bandwidths in the C-band (2.1 GHz), Ku-band (3.4 GHz), Ka-band (8 GHz) and V-band (4 GHz). The plasma process produces free-standing nitrogen-doped graphene sheets uniformly decorated with FexOy, MnOx, and TiOx nanoparticles, which are subsequently incorporated into a polymer matrix. The microwave plasma environment simultaneously enables graphene nanosheet synthesis, metal oxide nanoparticles formation, surface functionalization, multiphase generation, and the anchoring of nanoparticles onto the graphene scaffold. Using low-cost precursors such as acetonitrile and micron-sized metal oxides, the process achieves production rates of up to 50 mg min−1. Overall, this one-step plasma-enabled approach provides a low-cost, scalable, and efficient route for manufacturing lightweight, high-performance EM wave absorbers.
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BibTeX
@article{tatarova2026advanced,
title = {{Advanced N-Graphene-Based Electromagnetic Shields via Microwave Plasma Induced Synthesis}},
author = {Elena Tatarova and Neli Bundaleska and Edgar Felizardo and Ana Dias and Antonio Silva and Miroslav Abrashev and Jivko Kissovski and Janez Zavašnik and Uroš Cvelbar and Nenad Bundaleski and Orlando M. N. D. Teodoro and Amelia Almeida and Milena Georgieva and Todor Karadimov and Bruno Gonçalves},
journal = {Nanomaterials},
year = {2026},
month = oct,
doi = {10.3390/nano16211358},
url = {https://www.mdpi.com/2079-4991/16/21/1358},
note = {CC BY 4.0},
}
RIS
TY - JOUR
TI - Advanced N-Graphene-Based Electromagnetic Shields via Microwave Plasma Induced Synthesis
AU - Elena Tatarova
AU - Neli Bundaleska
AU - Edgar Felizardo
AU - Ana Dias
AU - Antonio Silva
AU - Miroslav Abrashev
AU - Jivko Kissovski
AU - Janez Zavašnik
AU - Uroš Cvelbar
AU - Nenad Bundaleski
AU - Orlando M. N. D. Teodoro
AU - Amelia Almeida
AU - Milena Georgieva
AU - Todor Karadimov
AU - Bruno Gonçalves
PY - 2026
DA - 2026/10/25
JO - Nanomaterials
DO - 10.3390/nano16211358
UR - https://www.mdpi.com/2079-4991/16/21/1358
AB - Here, a plasma-enabled strategy is presented for the controllable fabrication of ultralight nanocomposites with absorption-dominated EM-shielding performance across the 5–70 GHz frequency range. The fabricated nanocomposites exhibit average microwave absorption exceeding 60% across the 5–25 GHz frequency range and 70% across the 25–70 GHz range while maintaining a constant thickness of 2 mm and a fixed filler content of 15 wt%. Plasma-driven nanoscale engineering and multiphase hybridization synergistically enhance dielectric and magnetic loss mechanisms, resulting in effective absorption bandwidths in the C-band (2.1 GHz), Ku-band (3.4 GHz), Ka-band (8 GHz) and V-band (4 GHz). The plasma process produces free-standing nitrogen-doped graphene sheets uniformly decorated with FexOy, MnOx, and TiOx nanoparticles, which are subsequently incorporated into a polymer matrix. The microwave plasma environment simultaneously enables graphene nanosheet synthesis, metal oxide nanoparticles formation, surface functionalization, multiphase generation, and the anchoring of nanoparticles onto the graphene scaffold. Using low-cost precursors such as acetonitrile and micron-sized metal oxides, the process achieves production rates of up to 50 mg min−1. Overall, this one-step plasma-enabled approach provides a low-cost, scalable, and efficient route for manufacturing lightweight, high-performance EM wave absorbers.
SN - 2079-4991
ER -