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PreprintarXiv licencearXiv

Amorphous insulating MoSx films deposited by magnetron sputtering as a low-index optical coating

  • S. G. Martanov
  • E. V. Tarkaeva
  • A. V. Muratov
  • A. V. Lubenchenko
  • O. N. Pavlov
  • A. G. Vitukhnovsky
  • A. Yu. Kuntsevich
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Abstract

While much effort are now concentrated on exploration of crystalline form of MoS2 as a two-dimensional material, we show that room-temperature DC magnetron sputtering from pressurized MoS2 powder target produces amorphous MoSx films with optical properties fundamentally different from those of crystalline MoS2. The films were found to have a sulfur content of approximately x=1.8, indicating sulfur deficiency. They are optically isotropic and exhibit rather low optical losses, with a refractive index of about 2 over the visible and near-infrared spectral range. Their compatibility with lift-off lithography and dry etching makes amorphous MoSx a promising material for integrated photonic applications.

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Cite

BibTeXRIS
BibTeX
@misc{martanov2026amorphous,
  title = {{Amorphous insulating MoS$_x$ films deposited by magnetron sputtering as a low-index optical coating}},
  author = {S. G. Martanov and E. V. Tarkaeva and A. V. Muratov and A. V. Lubenchenko and O. N. Pavlov and A. G. Vitukhnovsky and A. Yu. Kuntsevich},
  howpublished = {arXiv},
  year = {2026},
  month = sep,
  doi = {10.48550/arxiv.2609.24326},
  eprint = {2609.24326},
  archivePrefix = {arXiv},
  url = {https://arxiv.org/abs/2609.24326},
}
RIS
TY  - UNPB
TI  - Amorphous insulating MoS_x films deposited by magnetron sputtering as a low-index optical coating
AU  - S. G. Martanov
AU  - E. V. Tarkaeva
AU  - A. V. Muratov
AU  - A. V. Lubenchenko
AU  - O. N. Pavlov
AU  - A. G. Vitukhnovsky
AU  - A. Yu. Kuntsevich
PY  - 2026
DA  - 2026/09/21
PB  - arXiv
DO  - 10.48550/arxiv.2609.24326
UR  - https://arxiv.org/abs/2609.24326
AB  - While much effort are now concentrated on exploration of crystalline form of MoS_2 as a two-dimensional material, we show that room-temperature DC magnetron sputtering from pressurized MoS_2 powder target produces amorphous MoS_x films with optical properties fundamentally different from those of crystalline MoS_2. The films were found to have a sulfur content of approximately x=1.8, indicating sulfur deficiency. They are optically isotropic and exhibit rather low optical losses, with a refractive index of about 2 over the visible and near-infrared spectral range. Their compatibility with lift-off lithography and dry etching makes amorphous MoS_x a promising material for integrated photonic applications.
ER  -