A detailed method for copper doping of synthetic hydroxyapatite thin films via plasma-assisted pulsed laser deposition
- 1Universidad Tecnológica de Pereira, Pereira-Risaralda, Colombia
- 2Departamento de Física, Facultad de Ciencias Básicas, Universidad Tecnológica de Pereira, Pereira-Risaralda, Colombia
- 3Doctorado en Ciencias, Universidad Tecnológica de Pereira, Pereira-Risaralda, Colombia
Abstract
This work provides a detailed and reproducible methodology for the fabrication of copper-doped hydroxyapatite (HAp-Cu) thin films on silicon substrates via Plasma-Assisted Pulsed Laser Deposition (PAPLD). The methodology is centered on the nanosecond pulsed laser ablation of a synthetic hydroxyapatite (HAp) target, physically modified through the incorporation of metallic copper filaments, which serve as a localized dopant source during the deposition process. This configuration enables the controlled co-deposition of hydroxyapatite and copper species, facilitating the formation of uniform thin films with potential bioactive properties. The proposed protocol comprises the following key elements: • Preparation of Targets: A comprehensive, stepwise procedure for the synthesis of hydroxyapatite powder and the subsequent fabrication of mechanically robust ceramic targets, including a novel approach for embedding copper filaments to ensure effective doping during laser ablation. • Deposition Parameters: Detailed specifications of the PAPLD system, encompassing laser characteristics (wavelength, fluence, repetition rate), target-to-substrate distance, and chamber vacuum conditions. These parameters have been optimized to ensure reproducibility in film growth and compositional consistency. • Validation Procedure: A systematic approach to validating the deposition process, focused on confirming the incorporation of copper into the hydroxyapatite matrix and verifying the formation of crystalline HAp-Cu films through targeted characterization techniques, distinct from exhaustive physicochemical or biological evaluations. The methodology described herein establishes a reliable framework for the fabrication of HAp-Cu coatings via PAPLD, offering a reproducible route for future studies requiring precise control over dopant incorporation within hydroxyapatite-based thin films. For further details regarding the physicochemical characterization and biological assessment of the resulting coatings, the reader is referred to a complementary publication by the authors.
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BibTeX
@article{santiago2026detailed,
title = {{A detailed method for copper doping of synthetic hydroxyapatite thin films via plasma-assisted pulsed laser deposition}},
author = {Leonardo Bohorquez Santiago and Diana Marcela Devia Narváez and Rogelio Ospina Ospina},
journal = {PLOS One},
year = {2026},
month = sep,
doi = {10.1371/journal.pone.0358441},
url = {https://doi.org/10.1371/journal.pone.0358441},
note = {CC BY 4.0},
}
RIS
TY - JOUR
TI - A detailed method for copper doping of synthetic hydroxyapatite thin films via plasma-assisted pulsed laser deposition
AU - Leonardo Bohorquez Santiago
AU - Diana Marcela Devia Narváez
AU - Rogelio Ospina Ospina
PY - 2026
DA - 2026/09/25
JO - PLOS One
DO - 10.1371/journal.pone.0358441
UR - https://doi.org/10.1371/journal.pone.0358441
AB - This work provides a detailed and reproducible methodology for the fabrication of copper-doped hydroxyapatite (HAp-Cu) thin films on silicon substrates via Plasma-Assisted Pulsed Laser Deposition (PAPLD). The methodology is centered on the nanosecond pulsed laser ablation of a synthetic hydroxyapatite (HAp) target, physically modified through the incorporation of metallic copper filaments, which serve as a localized dopant source during the deposition process. This configuration enables the controlled co-deposition of hydroxyapatite and copper species, facilitating the formation of uniform thin films with potential bioactive properties. The proposed protocol comprises the following key elements: • Preparation of Targets: A comprehensive, stepwise procedure for the synthesis of hydroxyapatite powder and the subsequent fabrication of mechanically robust ceramic targets, including a novel approach for embedding copper filaments to ensure effective doping during laser ablation. • Deposition Parameters: Detailed specifications of the PAPLD system, encompassing laser characteristics (wavelength, fluence, repetition rate), target-to-substrate distance, and chamber vacuum conditions. These parameters have been optimized to ensure reproducibility in film growth and compositional consistency. • Validation Procedure: A systematic approach to validating the deposition process, focused on confirming the incorporation of copper into the hydroxyapatite matrix and verifying the formation of crystalline HAp-Cu films through targeted characterization techniques, distinct from exhaustive physicochemical or biological evaluations. The methodology described herein establishes a reliable framework for the fabrication of HAp-Cu coatings via PAPLD, offering a reproducible route for future studies requiring precise control over dopant incorporation within hydroxyapatite-based thin films. For further details regarding the physicochemical characterization and biological assessment of the resulting coatings, the reader is referred to a complementary publication by the authors.
SN - 1932-6203
ER -