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Peer-reviewedCC BY-NCRSC Advances

Development and characterization of a chemically amplified positive-tone hybrid resist for thick-film microfabrication

  • Nour Nasrallah
  • Sylvie Calas
  • Pascal Etienne
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Abstract

Si NMR) confirm controlled copolymerization and a limited degree of condensation, preserving Si-OH groups that enhance adhesion to glass substrates. Photolithographic tests demonstrate good uniformity and pattern resolution, despite a narrow process window caused by the competition between deprotection and condensation catalyzed by photoacids. These findings provide promising perspectives for applications in microfluidics and optoelectronics, with future work focusing on broadening process latitude and integrating advanced functionalities.

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Cite

BibTeXRIS
BibTeX
@article{nasrallah2026development,
  title = {{Development and characterization of a chemically amplified positive-tone hybrid resist for thick-film microfabrication}},
  author = {Nour Nasrallah and Sylvie Calas and Pascal Etienne},
  journal = {RSC Advances},
  year = {2026},
  month = oct,
  doi = {10.1039/d6ra01627h},
  url = {https://hal.science/hal-05778740v1},
  note = {CC BY-NC},
}
RIS
TY  - JOUR
TI  - Development and characterization of a chemically amplified positive-tone hybrid resist for thick-film microfabrication
AU  - Nour Nasrallah
AU  - Sylvie Calas
AU  - Pascal Etienne
PY  - 2026
DA  - 2026/10/05
JO  - RSC Advances
DO  - 10.1039/d6ra01627h
UR  - https://hal.science/hal-05778740v1
AB  - Si NMR) confirm controlled copolymerization and a limited degree of condensation, preserving Si-OH groups that enhance adhesion to glass substrates. Photolithographic tests demonstrate good uniformity and pattern resolution, despite a narrow process window caused by the competition between deprotection and condensation catalyzed by photoacids. These findings provide promising perspectives for applications in microfluidics and optoelectronics, with future work focusing on broadening process latitude and integrating advanced functionalities.
SN  - 2046-2069
ER  -