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Peer-reviewedLicence not statedOptics Express

Plasmonic Lithography Optical Proximity Correction Method Based on Decomposed Machine Learning Fast Imaging Model

  • zhenyu xing
  • Huwen Ding
  • pengyu ren
  • Yayi Wei
Open at sourceDOICite

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Cite

BibTeXRIS
BibTeX
@article{xing2026plasmonic,
  title = {{Plasmonic Lithography Optical Proximity Correction Method Based on Decomposed Machine Learning Fast Imaging Model}},
  author = {zhenyu xing and Huwen Ding and pengyu ren and Yayi Wei},
  journal = {Optics Express},
  year = {2026},
  month = oct,
  doi = {10.1364/oe.611390},
  url = {https://opg.optica.org/oe/abstract.cfm?doi=10.1364/OE.611390},
}
RIS
TY  - JOUR
TI  - Plasmonic Lithography Optical Proximity Correction Method Based on Decomposed Machine Learning Fast Imaging Model
AU  - zhenyu xing
AU  - Huwen Ding
AU  - pengyu ren
AU  - Yayi Wei
PY  - 2026
DA  - 2026/10/09
JO  - Optics Express
DO  - 10.1364/oe.611390
UR  - https://opg.optica.org/oe/abstract.cfm?doi=10.1364/OE.611390
SN  - 1094-4087
ER  -