Fabry-Pérot Resonance Shifts as a Novel Non-destructive In Situ Surface Damage Diagnostic
Abstract
Current surface damage evaluation for nanostructured electronic devices requires specialized equipment or conditions outside the designed operating environment and cannot be used for in situ evaluation of surface damage. In this work, we developed a non-destructive method to probe the surface sublimation of a semiconductor heterostructure which can be applied to other semiconductor damage mechanisms. This approach employs shifts in the resonances of an optical cavity comprising the surface and an integrated distributed Bragg reflector fabricated below the semiconductor heterostructure undergoing sublimation. We performed the demonstration of this technique under vacuum, but surface damage effects can be observed in any operational environment either in situ or ex situ.
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BibTeX
@misc{blume2026fabrypérot,
title = {{Fabry-Pérot Resonance Shifts as a Novel Non-destructive In Situ Surface Damage Diagnostic}},
author = {Gregory Blume and Colin Kirk and Sushil Poudel and John Hill and Alimohammed Kachwala and Joseph Grames and Marcy L. Stutzman and Matt Grau and Sylvain Marsillac},
howpublished = {arXiv},
year = {2026},
month = sep,
doi = {10.48550/arxiv.2609.31522},
eprint = {2609.31522},
archivePrefix = {arXiv},
url = {https://arxiv.org/abs/2609.31522},
}
RIS
TY - UNPB
TI - Fabry-Pérot Resonance Shifts as a Novel Non-destructive In Situ Surface Damage Diagnostic
AU - Gregory Blume
AU - Colin Kirk
AU - Sushil Poudel
AU - John Hill
AU - Alimohammed Kachwala
AU - Joseph Grames
AU - Marcy L. Stutzman
AU - Matt Grau
AU - Sylvain Marsillac
PY - 2026
DA - 2026/09/28
PB - arXiv
DO - 10.48550/arxiv.2609.31522
UR - https://arxiv.org/abs/2609.31522
AB - Current surface damage evaluation for nanostructured electronic devices requires specialized equipment or conditions outside the designed operating environment and cannot be used for in situ evaluation of surface damage. In this work, we developed a non-destructive method to probe the surface sublimation of a semiconductor heterostructure which can be applied to other semiconductor damage mechanisms. This approach employs shifts in the resonances of an optical cavity comprising the surface and an integrated distributed Bragg reflector fabricated below the semiconductor heterostructure undergoing sublimation. We performed the demonstration of this technique under vacuum, but surface damage effects can be observed in any operational environment either in situ or ex situ.
ER -