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BibTeX

@article{zhang2026efficient,
  title = {{Efficient angle-aware differentiable Mask3D modeling for inverse lithography}},
  author = {Qingyan Zhang and Jie Zhou and Junbo Liu and Ji Zhou and Dajie Yu and Qiuyan Liu and Jianwen Gong and Haifeng Sun},
  journal = {Optics Express},
  year = {2026},
  month = nov,
  doi = {10.1364/oe.615526},
  url = {https://opg.optica.org/oe/abstract.cfm?doi=10.1364/OE.615526},
}

RIS

TY  - JOUR
TI  - Efficient angle-aware differentiable Mask3D modeling for inverse lithography
AU  - Qingyan Zhang
AU  - Jie Zhou
AU  - Junbo Liu
AU  - Ji Zhou
AU  - Dajie Yu
AU  - Qiuyan Liu
AU  - Jianwen Gong
AU  - Haifeng Sun
PY  - 2026
DA  - 2026/11/04
JO  - Optics Express
DO  - 10.1364/oe.615526
UR  - https://opg.optica.org/oe/abstract.cfm?doi=10.1364/OE.615526
SN  - 1094-4087
ER  -

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