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Peer-reviewedLicence not statedOptics Express

Gradient-based inverse design of phase-shifting transmission masks for EUV interference lithography

  • Lukas Dolfen
  • Lars Lohmann
  • Sascha Brose
  • Paul Buske
  • Annika Bonhoff
  • Carlo Holly
Open at sourceDOICite

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Cite

BibTeXRIS
BibTeX
@article{dolfen2026gradientbased,
  title = {{Gradient-based inverse design of phase-shifting transmission masks for EUV interference lithography}},
  author = {Lukas Dolfen and Lars Lohmann and Sascha Brose and Paul Buske and Annika Bonhoff and Carlo Holly},
  journal = {Optics Express},
  year = {2026},
  month = oct,
  doi = {10.1364/oe.612975},
  url = {https://opg.optica.org/oe/abstract.cfm?doi=10.1364/OE.612975},
}
RIS
TY  - JOUR
TI  - Gradient-based inverse design of phase-shifting transmission masks for EUV interference lithography
AU  - Lukas Dolfen
AU  - Lars Lohmann
AU  - Sascha Brose
AU  - Paul Buske
AU  - Annika Bonhoff
AU  - Carlo Holly
PY  - 2026
DA  - 2026/10/19
JO  - Optics Express
DO  - 10.1364/oe.612975
UR  - https://opg.optica.org/oe/abstract.cfm?doi=10.1364/OE.612975
SN  - 1094-4087
ER  -