Electrical Resistance Behavior of Printed Ag Nanowire Electrode Lines Under Transverse Tensile Strain
- 1Autonomous Manufacturing & Process R&D Department, Korea Institute of Industrial Technology, 143 Hanggaul-ro, Sangnok-gu, Ansan-si 15588, Republic of Korea
- 2School of Mechanical Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea
Abstract
Printed stretchable interconnects may experience tensile deformation perpendicular to the direction of current flow, but their electrical response under transverse loading remains insufficiently understood. In this study, dispenser-printed silver nanowire (Ag NW) line electrodes on polydimethylsiloxane were subjected to transverse tensile strains of 10–40% for 10 stretching–release cycles. Ten specimens were tested at each strain level. Resistance was measured in situ, and deformation-induced changes in the Ag NW network were examined using optical microscopy and field-emission scanning electron microscopy (FESEM). To distinguish the effects of macroscopic deformation from changes in network connectivity, the measured resistance was compared with geometric predictions based on Poisson-induced shortening of the printed line. At 10% strain, the stretched-state resistance closely followed the geometric prediction and remained nearly unchanged during cycling. At 20% strain, the resistance increased progressively with repeated cycling and local cracks were observed, whereas the first-cycle deviation from the geometric reference remained small relative to the specimen-to-specimen variation. At 30% and 40% strain, the measured resistance clearly exceeded the geometric reference in both the stretched and released states. After 10 cycles at 40% strain, the corresponding relative resistances reached 1.369 and 1.736, respectively. FESEM observations showed that conductive nanowire bridges remained across locally cracked regions at 20% strain, whereas crack penetration into the line interior and local pathway loss were observed at 30% strain. These results indicate an intermediate response at 20% strain and a clear transition to a network-damage-dominated response at 30% strain.
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BibTeX
@article{moon2026electrical,
title = {{Electrical Resistance Behavior of Printed Ag Nanowire Electrode Lines Under Transverse Tensile Strain}},
author = {Yoon Jae Moon and Jiyeong Kong and Sukkee Um and Kyung-Tae Kang},
journal = {Nanomaterials},
year = {2026},
month = oct,
doi = {10.3390/nano16201333},
url = {https://www.mdpi.com/2079-4991/16/20/1333},
note = {CC BY 4.0},
}
RIS
TY - JOUR
TI - Electrical Resistance Behavior of Printed Ag Nanowire Electrode Lines Under Transverse Tensile Strain
AU - Yoon Jae Moon
AU - Jiyeong Kong
AU - Sukkee Um
AU - Kyung-Tae Kang
PY - 2026
DA - 2026/10/01
JO - Nanomaterials
DO - 10.3390/nano16201333
UR - https://www.mdpi.com/2079-4991/16/20/1333
AB - Printed stretchable interconnects may experience tensile deformation perpendicular to the direction of current flow, but their electrical response under transverse loading remains insufficiently understood. In this study, dispenser-printed silver nanowire (Ag NW) line electrodes on polydimethylsiloxane were subjected to transverse tensile strains of 10–40% for 10 stretching–release cycles. Ten specimens were tested at each strain level. Resistance was measured in situ, and deformation-induced changes in the Ag NW network were examined using optical microscopy and field-emission scanning electron microscopy (FESEM). To distinguish the effects of macroscopic deformation from changes in network connectivity, the measured resistance was compared with geometric predictions based on Poisson-induced shortening of the printed line. At 10% strain, the stretched-state resistance closely followed the geometric prediction and remained nearly unchanged during cycling. At 20% strain, the resistance increased progressively with repeated cycling and local cracks were observed, whereas the first-cycle deviation from the geometric reference remained small relative to the specimen-to-specimen variation. At 30% and 40% strain, the measured resistance clearly exceeded the geometric reference in both the stretched and released states. After 10 cycles at 40% strain, the corresponding relative resistances reached 1.369 and 1.736, respectively. FESEM observations showed that conductive nanowire bridges remained across locally cracked regions at 20% strain, whereas crack penetration into the line interior and local pathway loss were observed at 30% strain. These results indicate an intermediate response at 20% strain and a clear transition to a network-damage-dominated response at 30% strain.
SN - 2079-4991
ER -