PreprintCC BY 4.0arXiv
12 nm FinFETs from 292 K to 10 mK: Characterization and a Temperature-Continuous Compact Model for Qubit Control
Abstract
We report cryogenic characterization and compact modeling of GlobalFoundries (GF) 12LP regular-voltage-threshold (RVT) n- and p-FinFETs, measured from 292 K to 10 mK. Both devices retain sub-Kelvin gate control without carrier freeze-out, with the n-type device exhibiting an intrinsic sub-threshold slope (SS) floor of 24.8 mV/dec. To bypass high on-chip series routing resistance that confounds peak-gm extraction, we adopt a fixed-current (3.26 uA/um) methodology. These low-current metrics inform a continuous 1.36 K to 292 K compact model using dynamic parameter injection, preserving room-temperature process development kit (PDK) qualification.
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BibTeX
@misc{lee2026finfets,
title = {{12 nm FinFETs from 292 K to 10 mK: Characterization and a Temperature-Continuous Compact Model for Qubit Control}},
author = {DaKyung Lee and Liyang Jin and Jungmin Lee and Rohit Rangaraj and Linbo Shao and Jeffrey S. Walling},
howpublished = {arXiv},
year = {2026},
month = sep,
doi = {10.48550/arxiv.2609.11963},
eprint = {2609.11963},
archivePrefix = {arXiv},
url = {https://arxiv.org/abs/2609.11963},
note = {CC BY 4.0},
}
RIS
TY - UNPB
TI - 12 nm FinFETs from 292 K to 10 mK: Characterization and a Temperature-Continuous Compact Model for Qubit Control
AU - DaKyung Lee
AU - Liyang Jin
AU - Jungmin Lee
AU - Rohit Rangaraj
AU - Linbo Shao
AU - Jeffrey S. Walling
PY - 2026
DA - 2026/09/01
PB - arXiv
DO - 10.48550/arxiv.2609.11963
UR - https://arxiv.org/abs/2609.11963
AB - We report cryogenic characterization and compact modeling of GlobalFoundries (GF) 12LP regular-voltage-threshold (RVT) n- and p-FinFETs, measured from 292 K to 10 mK. Both devices retain sub-Kelvin gate control without carrier freeze-out, with the n-type device exhibiting an intrinsic sub-threshold slope (SS) floor of 24.8 mV/dec. To bypass high on-chip series routing resistance that confounds peak-gm extraction, we adopt a fixed-current (3.26 uA/um) methodology. These low-current metrics inform a continuous 1.36 K to 292 K compact model using dynamic parameter injection, preserving room-temperature process development kit (PDK) qualification.
ER -