Controlled Growth of Architectured Boron Nitride Films by Chemical Vapor Deposition in Model Microchannels

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BibTeX

@article{mounerat2026controlled,
  title = {{Controlled Growth of Architectured Boron Nitride Films by Chemical Vapor Deposition in Model Microchannels}},
  author = {Alexandre Mounérat and Hervé Plaisantin and Sylvain Jacques and Julien Danet and Georges Chollon},
  journal = {Crystal Growth \& Design},
  year = {2026},
  month = may,
  doi = {10.1021/acs.cgd.6c00446},
  url = {https://hal.science/hal-05736263v1},
}

RIS

TY  - JOUR
TI  - Controlled Growth of Architectured Boron Nitride Films by Chemical Vapor Deposition in Model Microchannels
AU  - Alexandre Mounérat
AU  - Hervé Plaisantin
AU  - Sylvain Jacques
AU  - Julien Danet
AU  - Georges Chollon
PY  - 2026
DA  - 2026/05/25
JO  - Crystal Growth & Design
DO  - 10.1021/acs.cgd.6c00446
UR  - https://hal.science/hal-05736263v1
SN  - 1528-7483
SN  - 1528-7505
ER  -

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