PreprintCC BY 4.0arXiv
Versatile Sleeve-and-Bulk Fabrication of Inversely Designed Nanophotonic Structures with High Pattern Transfer Fidelity
Abstract
Inverse design is a powerful computational tool for generating nanophotonic devices that should outperform their traditionally designed counterparts. However, translating these theoretical gains into physical devices is challenging because the irregular and non-intuitive features that make inversely designed structures so effective also make them exceptionally difficult to fabricate, typically necessitating substantial process optimization unique to each device design. We describe a versatile two-step nanofabrication process that achieves pattern transfer fidelity in excess of 90% for each of three distinct inverse device designs with no device-specific process optimization.
Related
- Scalable integration of silicon carbide color centers into nanophotonic structures
- From random patterns to nanophotonic structures: Electromagnetic field prediction without retraining
- From Fabrication Disorder to Quantum-Protocol Yield in Inverse-Designed Silicon Photonic Beam Splitters
- 1/f frequency noise in mechanical resonators scales inversely with volume, not with quality factor
- Unified light-matter metric of molecular and nanophotonic chirality
BibTeX
@misc{mai2026versatile,
title = {{Versatile Sleeve-and-Bulk Fabrication of Inversely Designed Nanophotonic Structures with High Pattern Transfer Fidelity}},
author = {Lan Hoang Mai and Radheya Sham Sarode and William G. Eshbaugh and Sulaiman Al Ghadani and Tyler Manfre and Nazifa Tasnim Arony and Joshua M. O. Zide and Matthew F. Doty and Edward B. Flagg},
howpublished = {arXiv},
year = {2026},
month = sep,
doi = {10.48550/arxiv.2609.13460},
eprint = {2609.13460},
archivePrefix = {arXiv},
url = {https://arxiv.org/abs/2609.13460},
note = {CC BY 4.0},
}
RIS
TY - UNPB
TI - Versatile Sleeve-and-Bulk Fabrication of Inversely Designed Nanophotonic Structures with High Pattern Transfer Fidelity
AU - Lan Hoang Mai
AU - Radheya Sham Sarode
AU - William G. Eshbaugh
AU - Sulaiman Al Ghadani
AU - Tyler Manfre
AU - Nazifa Tasnim Arony
AU - Joshua M. O. Zide
AU - Matthew F. Doty
AU - Edward B. Flagg
PY - 2026
DA - 2026/09/11
PB - arXiv
DO - 10.48550/arxiv.2609.13460
UR - https://arxiv.org/abs/2609.13460
AB - Inverse design is a powerful computational tool for generating nanophotonic devices that should outperform their traditionally designed counterparts. However, translating these theoretical gains into physical devices is challenging because the irregular and non-intuitive features that make inversely designed structures so effective also make them exceptionally difficult to fabricate, typically necessitating substantial process optimization unique to each device design. We describe a versatile two-step nanofabrication process that achieves pattern transfer fidelity in excess of 90% for each of three distinct inverse device designs with no device-specific process optimization.
ER -