Skip to content
DraconiticResearch
Search Sources API
184,584 studies31 sourcesUpdated 7 min ago
PreprintCC BY-NC-ND 4.0arXiv

Heteroepitaxial Growth of PbSe on InP Substrates via Lattice-Matched III-V Buffer Layers

Abstract

Detector cost remains a barrier to the widespread adoption of mid-wave infrared (3-5 micron) technology. PbSe, an inexpensive narrow band gap IV-VI semiconductor that has been used since the early 1940s, delivers high performance for infrared detection despite the abundance of grain boundaries in polycrystalline films. Epitaxial growth, however, could provide superior crystalline quality and interfaces, but suitable substrates remain limited for PbSe. Recent PbSe heteroepitaxy has focused primarily on III-V, II-VI and group-IV substrates that each offer a comparatively narrow range of lattice-matched alloys for heterostructure engineering. Here we show that InP-based heteroepitaxy provides access to a broader materials platform while limiting the lattice mismatch with PbSe to approximately 4%. We grow 150-nm thick PbSe films by molecular beam epitaxy on 200-nm thick In0.53Ga0.47As and In0.52Al0.48As buffers on (001) InP substrates. Reflection high-energy electron diffraction and X-ray diffraction show (001)-oriented rock-salt PbSe with an out-of-plane lattice constant of 6.12 Angstrom on both buffers. Photoluminescence (PL) is observed from room-temperature down to 12 K and the peak wavelength red-shifts from 3.7 to 5.0 microns. Under identical measurement conditions, the room-temperature peak PL intensities from films on In0.53Ga0.47As and In0.52Al0.48As are approximately 1.9x and 1.3x that of a PbSe on GaAs substrate reference, respectively. These results establish an InP-compatible platform for integrating narrow band-gap PbSe with a broad range of ternary and quaternary III-V alloys, including, for example, structures in which In0.53Ga0.47As serves as both a short-wave infrared absorber and a template for PbSe growth.

Related

  1. Fast-Neutron Irradiation Effect in Heteroepitaxial β-Ga2O3 Schottky Diodes Fabricated on Low-Cost Sapphire Substrates
    Saleh Ahmed Khan, Ahmed Ibreljic, Sourav Sarker +2
    arXivPreprintarXiv licenceFull text1 citedApplied physics & instrumentationarXiv
  2. Realization of Very High Mobility InAs Quantum Wells on InP Substrates Through Convex InAlAs Graded Buffer Optimization
    Tyler Lindemann, Rojila Ghimire, Alejandro Alcaraz Ramirez +4
    arXivPreprintCC BY 4.0Full textCondensed matterarXiv
  3. Epitaxial growth of strain-relaxed GeSn alloys on Si utilizing Sn-composition-graded buffer layer for mid-infrared photodetectors
    Kuo-Chih Lee, Ping-Chien Hsieh, Yue-Tong Jheng +9
    Optical MaterialsPeer-reviewedCC BY-NC-ND 4.0Full textGeneral physicsHAL
  4. FLAKE: Friction and Lattice Analysis of Kinetics and Energetics of rigid 2D clusters on crystalline substrates
    Andrea Silva
    arXivPreprintCC BY 4.0Full textCondensed matterarXiv
  5. Face-to-face anneal temperature controls lattice parameter in Ta(C,N) virtual substrates for AlGaN power electronics
    Noah Zahn, Julia L. Martin, Michelle A. Smeaton +3
    arXivPreprintarXiv licenceFull textCondensed matterarXiv
BibTeX
@misc{rodriguez2026heteroepitaxial,
  title = {{Heteroepitaxial Growth of PbSe on InP Substrates via Lattice-Matched III-V Buffer Layers}},
  author = {Biridiana Rodriguez and Mark Martino and Brody Yeung and Benjamin Sprenger and Leland Nordin},
  howpublished = {arXiv},
  year = {2026},
  month = sep,
  doi = {10.48550/arxiv.2609.09605},
  eprint = {2609.09605},
  archivePrefix = {arXiv},
  url = {https://arxiv.org/abs/2609.09605},
  note = {CC BY-NC-ND 4.0},
}
RIS
TY  - UNPB
TI  - Heteroepitaxial Growth of PbSe on InP Substrates via Lattice-Matched III-V Buffer Layers
AU  - Biridiana Rodriguez
AU  - Mark Martino
AU  - Brody Yeung
AU  - Benjamin Sprenger
AU  - Leland Nordin
PY  - 2026
DA  - 2026/09/09
PB  - arXiv
DO  - 10.48550/arxiv.2609.09605
UR  - https://arxiv.org/abs/2609.09605
AB  - Detector cost remains a barrier to the widespread adoption of mid-wave infrared (3-5 micron) technology. PbSe, an inexpensive narrow band gap IV-VI semiconductor that has been used since the early 1940s, delivers high performance for infrared detection despite the abundance of grain boundaries in polycrystalline films. Epitaxial growth, however, could provide superior crystalline quality and interfaces, but suitable substrates remain limited for PbSe. Recent PbSe heteroepitaxy has focused primarily on III-V, II-VI and group-IV substrates that each offer a comparatively narrow range of lattice-matched alloys for heterostructure engineering. Here we show that InP-based heteroepitaxy provides access to a broader materials platform while limiting the lattice mismatch with PbSe to approximately 4%. We grow 150-nm thick PbSe films by molecular beam epitaxy on 200-nm thick In0.53Ga0.47As and In0.52Al0.48As buffers on (001) InP substrates. Reflection high-energy electron diffraction and X-ray diffraction show (001)-oriented rock-salt PbSe with an out-of-plane lattice constant of 6.12 Angstrom on both buffers. Photoluminescence (PL) is observed from room-temperature down to 12 K and the peak wavelength red-shifts from 3.7 to 5.0 microns. Under identical measurement conditions, the room-temperature peak PL intensities from films on In0.53Ga0.47As and In0.52Al0.48As are approximately 1.9x and 1.3x that of a PbSe on GaAs substrate reference, respectively. These results establish an InP-compatible platform for integrating narrow band-gap PbSe with a broad range of ternary and quaternary III-V alloys, including, for example, structures in which In0.53Ga0.47As serves as both a short-wave infrared absorber and a template for PbSe growth.
ER  -