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Peer-reviewedCC BY-NC-ND 4.0Nature Communications

Integration of high-κ oxide on 2D semiconductors with carbon-dot monolayer assembly as van der Waals interfacial layer

  • Sunny Wong
  • Fufei An
  • Yu Wu
  • Viet Hung Pham
  • Yanxiao Li
  • Robert L. Thompson
  • Junseok Lee
  • Kaijun Yin
  • Hanyu Hou
  • Yuan Gao
  • Jian-Min Zuo
  • Congjun Wang
2 more authors
  • Christopher Matranga
  • Qing Cao
Open at sourcePDFDOICite

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Cite

BibTeXRIS
BibTeX
@article{wong2026integration,
  title = {{Integration of high-κ oxide on 2D semiconductors with carbon-dot monolayer assembly as van der Waals interfacial layer}},
  author = {Sunny Wong and Fufei An and Yu Wu and Viet Hung Pham and Yanxiao Li and Robert L. Thompson and Junseok Lee and Kaijun Yin and Hanyu Hou and Yuan Gao and Jian-Min Zuo and Congjun Wang and Christopher Matranga and Qing Cao},
  journal = {Nature Communications},
  year = {2026},
  month = oct,
  doi = {10.1038/s41467-026-78053-3},
  url = {https://www.nature.com/articles/s41467-026-78053-3},
  note = {CC BY-NC-ND 4.0},
}
RIS
TY  - JOUR
TI  - Integration of high-κ oxide on 2D semiconductors with carbon-dot monolayer assembly as van der Waals interfacial layer
AU  - Sunny Wong
AU  - Fufei An
AU  - Yu Wu
AU  - Viet Hung Pham
AU  - Yanxiao Li
AU  - Robert L. Thompson
AU  - Junseok Lee
AU  - Kaijun Yin
AU  - Hanyu Hou
AU  - Yuan Gao
AU  - Jian-Min Zuo
AU  - Congjun Wang
AU  - Christopher Matranga
AU  - Qing Cao
PY  - 2026
DA  - 2026/10/07
JO  - Nature Communications
DO  - 10.1038/s41467-026-78053-3
UR  - https://www.nature.com/articles/s41467-026-78053-3
SN  - 2041-1723
ER  -