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Peer-reviewedCC BYMicromachines

Pareto-Guided Process Optimization of Single-Crystal InP Chemical Mechanical Polishing: Balancing Material Removal Rate and Surface Roughness

4 affiliations
  1. 1Yunnan Lincang Xinyuan Germanium Industry Co., Ltd., Lincang 677000, China;
  2. 2Faculty of Mechanical and Electrical Engineering, Kunming University of Science and Technology, Kunming 650500, China; (J.Z.); (J.G.)
  3. 3Yunnan Xinyao Semiconductor Materials Co., Ltd., Kunming 650503, China; (H.W.); (H.L.); (S.W.); (T.L.)
  4. 4Yunnan Zhongke Xinyuan Crystal Materials Co., Ltd., Kunming 650503, China; (J.L.); (C.L.)

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BibTeX
@article{deng2026paretoguided,
  title = {{Pareto-Guided Process Optimization of Single-Crystal InP Chemical Mechanical Polishing: Balancing Material Removal Rate and Surface Roughness}},
  author = {Jiayun Deng and Junjiang Zhou and Jiacheng Geng and Hua Wei and Hanbao Liu and Jiao Li and Shunjin Wang and Changlin Li and Tinglong Liu and Feng Hui},
  journal = {Micromachines},
  year = {2026},
  month = sep,
  url = {https://europepmc.org/article/PMC/PMC13706930},
  note = {CC BY},
}
RIS
TY  - JOUR
TI  - Pareto-Guided Process Optimization of Single-Crystal InP Chemical Mechanical Polishing: Balancing Material Removal Rate and Surface Roughness
AU  - Jiayun Deng
AU  - Junjiang Zhou
AU  - Jiacheng Geng
AU  - Hua Wei
AU  - Hanbao Liu
AU  - Jiao Li
AU  - Shunjin Wang
AU  - Changlin Li
AU  - Tinglong Liu
AU  - Feng Hui
PY  - 2026
DA  - 2026/09/22
JO  - Micromachines
UR  - https://europepmc.org/article/PMC/PMC13706930
SN  - 2072-666X
ER  -