Peer-reviewedCC BYMicromachines
Pareto-Guided Process Optimization of Single-Crystal InP Chemical Mechanical Polishing: Balancing Material Removal Rate and Surface Roughness
4 affiliations
- 1Yunnan Lincang Xinyuan Germanium Industry Co., Ltd., Lincang 677000, China;
- 2Faculty of Mechanical and Electrical Engineering, Kunming University of Science and Technology, Kunming 650500, China; (J.Z.); (J.G.)
- 3Yunnan Xinyao Semiconductor Materials Co., Ltd., Kunming 650503, China; (H.W.); (H.L.); (S.W.); (T.L.)
- 4Yunnan Zhongke Xinyuan Crystal Materials Co., Ltd., Kunming 650503, China; (J.L.); (C.L.)
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BibTeX
@article{deng2026paretoguided,
title = {{Pareto-Guided Process Optimization of Single-Crystal InP Chemical Mechanical Polishing: Balancing Material Removal Rate and Surface Roughness}},
author = {Jiayun Deng and Junjiang Zhou and Jiacheng Geng and Hua Wei and Hanbao Liu and Jiao Li and Shunjin Wang and Changlin Li and Tinglong Liu and Feng Hui},
journal = {Micromachines},
year = {2026},
month = sep,
url = {https://europepmc.org/article/PMC/PMC13706930},
note = {CC BY},
}
RIS
TY - JOUR
TI - Pareto-Guided Process Optimization of Single-Crystal InP Chemical Mechanical Polishing: Balancing Material Removal Rate and Surface Roughness
AU - Jiayun Deng
AU - Junjiang Zhou
AU - Jiacheng Geng
AU - Hua Wei
AU - Hanbao Liu
AU - Jiao Li
AU - Shunjin Wang
AU - Changlin Li
AU - Tinglong Liu
AU - Feng Hui
PY - 2026
DA - 2026/09/22
JO - Micromachines
UR - https://europepmc.org/article/PMC/PMC13706930
SN - 2072-666X
ER -